1.

Conference Proceedings
Conference Proceedings
1. Defect printability and inspection capability for tri-tone PSM
Nagamura, Y. ; Maetoko, K. ; Maeshima, K. ; Tamada, N. ; Hosono, K. ; Fujimoto, M. ; Kodera, Y. ; Goto, K. ; Narita, T. ; Matsuo, F. ; Akima, S. ; Ishijima, M. ; Iwasaki, H. ; Kikuchi, Y.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.454-465,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
2.

Conference Proceedings
Conference Proceedings
2. Improvement of critical dimension stability of chemically amplified resist by overcoat II
Kumada, T. ; Tange, K. ; Maetoko, K. ; Hosono, K. ; Tsuzuki, M. ; Yonetani, K. ; Terada, R. ; Nakashiba, Y. ; Anzai, S. ; Kikuchi, Y.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.101-106,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
3.

Conference Proceedings
Conference Proceedings
3. Fabrication of MoSiON halftone masks using ZEP7000 for MEBES 4500
Maetoko, K. ; Tange, K. ; Fukuma, H. ; Yoshioka, N. ; Kawada, S. ; Ishizuka, M. ; Sasaki, T. ; Sauer, C. A.
Pub. info.: Photomask and X-Ray Mask Technology VI.  pp.350-357,  1999.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3748
4.

Conference Proceedings
Conference Proceedings
4. Improvement of critical dimension stability of chemical amplified resist by overcoat
Kumada, T. ; Sasahara, A. ; Maetoko, K. ; Hosono, K. ; Honma, T ; Kodaira, Y. ; Nakashiba, Y. ; Tsuzuki, M. ; Kikuchi, Y.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.188-195,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754