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10 results

1.

Conference Proceedings

1. INTEGRATION ISSUES OF POLYSILICON WITH HIGH K DIELECTRICS DEPOSITED BY ATOMIC LAYER CHEMICAL VAPOR DEPOSITION

Tsai, W. ; Chen, I. ; Carter, R. ; Cartier, E. ; Kluth, J. ; Richard, O. ; Claes, M. ; Lin, Y.M. ; Nohira, H. ; Conard, T. ; Caymax, M. ; Young, E. ; Vandervorst, W. ; DeGendt, S. ; Heyns, M. ; Manabe, Y. ; Maes, J.W. ; Rittersma, Z.M. ; Besling, W. ; Roozeboom, F.

Pub. info.:	Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology. pp.747-760, 2002. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2002-2

2.

Conference Proceedings

2. Application of X-Ray Fluorescence Spectrometry in Characterization of High-k Ultra-Thin Films

Zhao, C. ; Brijs, B. ; Dortu, F. ; DeGendt, S. ; Caymax, M. ; Heyns, M. ; Besling, W. ; Maes, J.W.

Pub. info.:	Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah. pp.243-251, 2003. Pennington, NJ. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5133

3.

Conference Proceedings

3. Characterization of Nano-Laminate Structure Using Grazing Incidence XRD and ATR-FTIR

Zhao, C. ; DeGendt, S. ; Caymax, M. ; Heyns, M. ; Consier, V. ; Maes, J.W. ; Roebben, G. ; Van Der Biest, O.

Pub. info.:	Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah. pp.252-259, 2003. Pennington, NJ. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5133

4.

Conference Proceedings

4. (19.2) 1:30 - 1:50 PM - Maximization of Active As Doping in (selective) Epitaxial Si and SiGe Layers

Loo, R. ; Bajolet, P. ; Maes, J.W. ; Bauer, M. ; Caymax, M. ; Arena, C. (MEC)

Pub. info.:	SiGe: materials, processing, and devices : proceedings of the First international symposium. pp.1123-1134, 2004. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2004-07

5.

Conference Proceedings

5. Effect of Al-Content and Post Deposition Annealing on the Electrical Properties of Ultra-Thin HfAlxOy Layers

Carter, R.J. ; Tsai, W. ; Young, E. ; Caymax, M. ; Maes, J.W. ; Chen, P.J. ; Delabie, A. ; Zhao, C. ; Gendt, S.De ; Heyns, M.

Pub. info.:	Novel materials and processes for advances CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A.. pp.35-40, 2003. Warrendale, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	745

6.

Conference Proceedings

6. High Temperature Stability of High-K Dielectrics: Thermal Processing and Kinetics

Young, E.W.A. ; Chen, J. ; Cosnier, V. ; Lysagh, P. ; Maes, J.W. ; Roozeboom, F. ; Zhao, C. ; Carter, R. ; Richard, O. ; Conard, T.

Pub. info.:	Rapid thermal and other short-time processing technologies III : proceedings of the international symposium. pp.125-136, 2002. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2002-11

7.

Conference Proceedings

7. Application of X-Ray Fluorescence Spectrometry in Characterization of High-k Ultra-Thin Films

Zhao, C. ; Bijjs, B. ; Dortu, F. ; DeGendt, S. ; Caymax, M ; Heyns, M ; Besling, W ; Maes, J.W.

Pub. info.:	Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah. pp.243-251, 2003. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2003-3

8.

Conference Proceedings

8. INTEGRATION ISSUES OF POLYSILICON WITH HIGH K DIELECTRICS DEPOSITED BY ATOMIC LAYER CHEMICAL VAPOR DEPOSITION

Tsai, W. ; Chen, I. ; Carter, R. ; Cartier, E. ; Kluth, J. ; Richard, O. ; Claes, M. ; Lin, Y.M. ; Nohira, H. ; Conard, T. ; Caymax, M. ; Young, E. ; Vandervorst, W. ; DeGendt, S. ; Heyns, M. ; Manabe, Y. ; Maes, J.W. ; Rittersma, Z.M. ; Besling, W. ; Roozeboom, F.

Pub. info.:	Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology. pp.747-760, 2002. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2002-2

9.

Conference Proceedings

9. Physical-Chemical Evolution Upon Thermal Treatments of Al2O3, HfO2 and Al/Hf Composite Materials Deposited by ALCVDTM

Crivelli, B. ; Alessandri, M. ; Alberici, S. ; Cazzaniga, F. ; Dekadjevi, D. ; Maes, J.W. ; Ottaviani, G. ; Pavia, G. ; Queirolo, G. ; Santucci, S. ; Zanderigo, F.

Pub. info.:	Novel materials and processes for advances CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A.. pp.149-154, 2003. Warrendale, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	745

10.

Conference Proceedings

10. ALD HfO2 Surface Preparation Study

Delabie, Annelies ; Caymax, M. ; Maes, J.W. ; Bajolet, P. ; Brijs, B. ; Cartier, E. ; Conard, T. ; Gendt, S.De ; Richard, O. ; Vandervorst, W. ; Zhao, C. ; Green, M. ; Tsai, W. ; Heyns, M.M.

Pub. info.:	Novel materials and processes for advances CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A.. pp.179-184, 2003. Warrendale, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	745

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