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18 results

Conference Proceedings

1. Novel negative photoresist based on polar alicyclic polymers for ArF excimer laser lithography

Iwasa,S. ; Nakano,K. ; Maeda,K. ; Hasegawa,E.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.417-424, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

2. ArF excimer-laser exposure durability of chromium-fluoride-attenuated phase-shift masks

Seki,Y. ; Ushioda,J. ; Saito,T. ; Maeda,K. ; Nakano,K. ; Iwasa,S. ; Ohfuji,T. ; Tanabe,H.

Pub. info.:	Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan. pp.286-293, 1997. Bellingham, Washington. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3096

Conference Proceedings

3. Function-integrated alicyclic polymer for ArF chemically amplified resists

Maeda,K. ; Nakano,K. ; Iwasa,S. ; Hasegawa,E.

Pub. info.:	Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.55-64, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3049

Conference Proceedings

4. Effect of polymer structure on dissolution-rate characteristics in carboxylated alicyclic polymers for 193-nm lithography

Iwasa,S. ; Maeda,K. ; Nakano,K. ; Hasegawa,E.

Pub. info.:	Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.126-134, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3049

Conference Proceedings

5. Automatic parallel optical proximity correction and verification system

Watanabe,T. ; Tsujimoto,E. ; Nakajo,K. ; Maeda,K.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part2 pp.1015-1023, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

6. Adhesion characteristics of alicyclic polymers for use in ArF excimer laser lithography

Nakano,K. ; Iwasa,S. ; Maeda,K. ; Hasegawa,E.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.43-52, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

7. High-average-power YAG lasers and applications(Invited Paper)

Kanazawa,H. ; Nishimi,A. ; Uehara,M. ; Maeda,K. ; Wakasa,Y.

Pub. info.:	XI International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference : 25-30 August 1996, Heriot-Watt University, Edinburgh, UK. pp.38-43, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3092

Conference Proceedings

8. Dissolution behavior of alicyclic polymers designed for ArF excimer laser lithography

Ohfuji,T. ; Maeda,K. ; Nakano,K. ; Hasegawa,E.

Pub. info.:	Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California. pp.386-398, 1996. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2724

Conference Proceedings

9. Novel alkaline-soluble alicyclic polymer poly(TCDMACOOH)for ArF chemically amplified positive resists

Maeda,K. ; Nakano,K. ; Ohfuji,T. ; Hasegawa,E.

Pub. info.:	Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California. pp.377-385, 1996. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2724

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Conference Proceedings

10. Reaction mechanisms in silicon-based resist materials:polysilanes for deep-UV,EUV,and x-ray lithography

Seki,S. ; Sakurai,Y. ; Maeda,K. ; Kunimi,Y. ; Nagahara,S. ; Tagawa,S.

Pub. info.:	Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA. Part1 pp.423-430, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3999

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Author: Maeda,K.