1.

Conference Proceedings
Conference Proceedings
1. Era of double exposure in 7O nm node DRAM cell
Lim, C.-M. ; Eom, T.-S. ; Kim, S.-M. ; Bok, C. ; Ma, W.-K. ; Park, G.-D. ; Moon, S.-C. ; Kim, J.-W.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.368-376,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. Comparative study of chromeless and attenuated phase shift mask for 0.3-k1 ArF lithography of DRAM
Eom, T.-S. ; Lim, C.-M. ; Kim, S.-M. ; Kim, H.-B. ; Oh, S.-Y. ; Ma, W.-K. ; Moon, S.-C. ; Shin, K.S.
Pub. info.: Optical Microlithography XVI.  Part Three  pp.1310-1320,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
3.

Conference Proceedings
Conference Proceedings
3. Optical lithography simulation considering impact of mask errors
Kim, H.-B. ; Ma, W.-K. ; Ahn, C.-N. ; Shin, K.-S.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1278-1286,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
4.

Conference Proceedings
Conference Proceedings
4. Defect printability and specification of ArF mask in repeating feature
Kim, W.-H. ; Ma, W.-K. ; Kim, H.-B.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1357-1365,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
5.

Conference Proceedings
Conference Proceedings
5. Double exposure to reduce overall line-width variation of 80-nm DRAM gate
Ma, W.-K. ; Lim, C.-M. ; Oh, S.-Y. ; Nam, B.-H. ; Moon, S.-C. ; Shin, K.S.
Pub. info.: Optical Microlithography XVII.  pp.939-946,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377