Geoinformatics 2006 : Remotely sensed data and information : 28-29 October 2006, Wuhan, China. pp.64192F-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Li, S. ; Ma, S. ; Wang, W. ; Wang, G. ; Meng, X. ; Sun, J. ; Chu, J.
Pub. info.:
Infrared detector materials and devices : 4-5 August 2004, Denver, Colorado, USA. pp.133-139, 2004. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Wang, W. ; Xu, M. ; Xia, Y. ; Chen, M. ; Liang, J. ; Ma, S.
Pub. info.:
Holography, diffractive optics, and applications II : 8-11 November 2004, Beijing, China. pp.749-756, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
ULSI science and technology, 1995 : proceedings of the Fifth International Symposium on Ultra Large Scale Integration Science and Technology. pp.410-417, 1995. Pennington, NJ. Electrochemical Society
Applications of digital image processing XXVII : 2-6 August 2004, Denver, Colorado, USA. pp.547-554, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ma, S. ; Bjorkman, C. ; Mays, B. ; Kropwenicki, T. ; Feng, T. ; Li, Q. ; Dadu, U. ; Chang, M. ; Shan, H.
Pub. info.:
Thin film materials, processes, and reliability : proceedings of the international symposium. pp.14-22, 2001. Pennington, N.J.. Electrochemical Society
Budrys, A. J. ; Cao, M. ; Greene, W. ; Kooi, G. ; Lin, J. ; Ma, S. ; Ray, G. W. ; Stork, H. ; Theil, J. A. ; Yoon, U.
Pub. info.:
Amorphous and heterogeneous silicon thin films - 2000 : symposium held April 24-28, 2000, San Francisco, California, U.S.A.. pp.A14.3-, 2001. Warrendale. Materials Research Society
Proceedings of the Symposium on Process control, Diagnostics, and Modeling in Semiconductor Manufacturing. pp.401-411, 1995. Pennington, NJ. Electrochemical Society