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Conference Proceedings

1. Scatterometric sensor for lithography

C.J. Raymond ; M.R. Murnane ; S.S.H. Naqvi ; J.R. McNeil

Pub. info.:	Manufacturing process control for microelectronic devices and circuits : 20-21 October 1994, Austin, Texas. pp.37-49, 1994. Bellingham, WA. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2336

Conference Proceedings

2. Subwavelength photoresist grating metrology using scatterometry

M.R. Murnane ; C.J. Raymond ; S.S.H. Naqvi ; J.R. McNeil

Pub. info.:	Application and theory of periodic structures : 10-12 July, 1995, San Diego, California. pp.251-261, 1995. Bellingham, WA. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2532

Conference Proceedings

3. Scatterometry for 0.24- to 0.70-µm developed photoresist metrology

M.R. Murnane ; C.J. Raymond ; S.L. Prins ; S.S.H. Naqvi ; J.R. McNeil

Pub. info.:	Integrated circuit metrology, inspection, and process control IX : 20-22 February 1995, Santa Clara, California. pp.427-436, 1995. Bellingham, WA. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2439