1.

Conference Proceedings
Conference Proceedings
1. HfO2 Atomic Layer Deposition Using HfCl4/H2O: The First Reaction Cycle
L. Nyns ; A. Delabie ; M. Caymax ; M.M. Heyns ; S. Van Elshocht
Pub. info.: Atomic layer deposition applications 4.  pp.257-267,  2007.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 16(4)
2.

Conference Proceedings
Conference Proceedings
2. Ge and III/V as Enabling Materials for Future CMOS Technologies
M.M. Heyns ; M.M. Meuris ; M.R. Caymax
Pub. info.: SiGe and Ge, materials, processing, and devices.  pp.511-518,  2006.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 3(7)