1.

Conference Proceedings
Conference Proceedings
1. The application of SMASH alignment system for 65-55-nm logic devices
M. Miyasaka ; H. Saito ; T. Tamura ; T. Uchiyama ; P. Hinnen ; H. Lee ; M. van Kemenade ; M. Shahrjerdy ; R. van Leeuwen
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518
2.

Conference Proceedings
Conference Proceedings
2. Integration of a new alignment sensor for advanced technology nodes
P. Hinnen ; J. Depre ; S. Tanaka ; S. Lim ; O. Brioso ; M. Shahrjerdy ; K. Ishigo ; T. Kono ; T. Higashiki
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520