High-index immersion lithography with second-generation immersion fluids to enable numerical aperatures of 1.55 for cost effective 32-nm half pitches
- Author(s):
R. H. French ( DuPont Co. (USA) ) V. Liberman ( MIT Lincoln Lab (USA) ) H. V. Tran ( DuPont Co. (USA) ) J. Feldman ( DuPont Co. (USA) ) D. J. Adelman ( DuPont Co. (USA) ) R. C. Wheland ( DuPont Co. (USA) ) W. Qiu ( DuPont Co. (USA) ) S. J. McLain ( DuPont Co. (USA) ) O. Nagao ( DuPont K. K. (Japan) ) M. Kaku ( DuPont K. K. (Japan) ) M. Mocella ( DuPont Co. (USA) ) M. K. Yang ( DuPont Co. (USA) ) M. F. Lemon ( DuPont Co. (USA) ) L. Brubaker ( DuPont Co. (USA) ) A. L. Shoe ( DuPont Co. (USA) ) B. Fones ( DuPont Co. (USA) ) B. E. Fischel ( DuPont Co. (USA) ) K. Krohn ( MIT Lincoln Lab (USA) ) D. Hardy ( MIT Lincoln Lab (USA) ) C. Y. Chen ( DuPont-EKC (USA) ) - Publication title:
- Optical microlithography XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6520
- Pub. Year:
- 2007
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466396 [0819466395]
- Language:
- English
- Call no.:
- P63600/6520
- Type:
- Conference Proceedings
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