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Conference Proceedings

1. Effect of deposition, sputtering, and evaporation of lithium debris buildup on EUV optics

M. J. Neumann ; M. Cruce ; P. Brown ; S. N. Srivasta ; D. N. Ruzic ; O. Khodykin

Pub. info.:	Emerging lithographic technologies XI. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6517

Conference Proceedings

2. Grazing incidence ion beams for reducing LER

C. R. M. Struck ; M. J. Neumann ; R. Raju ; R. L. Bristol ; D. N. Ruzic

Pub. info.:	Lithography Asia 2008. 2 pp.71402P-1-71402P-12, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	7140

Conference Proceedings

3. Plasma cleaning of nanoparticles from EUV mask materials by electrostatics

W. M. Lytle ; R. Raju ; H. Shin ; C. Das ; M. J. Neumann

Pub. info.:	Metrology, inspection, and process control for microlithography XXII. 1 pp.69220D-1-69220D-9, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6922

Conference Proceedings

4. Lithium debris removal by sputtering and evaporation for EUV optics and applications

M. J. Neumann ; M. J. Cruce ; D. N. Ruzic

Pub. info.:	Emerging lithographic technologies XII. 2 pp.69213D-1-69213D-12, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6921