1.

Conference Proceedings
Conference Proceedings
1. Effect of photo-acid generator concentration and developer strength on the patterning capabilities of a model EUV photoresist
K. Choi ; V. M. Prabhu ; K. A. Lavery ; E. K. Lin ; W. Wu ; J. T. Woodward ; M. J. Leeson ; H. B. Cao ; M. Chandhok ; G. Thompson
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519
2.

Conference Proceedings
Conference Proceedings
2. Critical parameters influencing the EUV-induced damage of Ru-capped multilayer mirrors
S. B. Hill ; I. Ermanoski ; C. Tarrio ; T. B. Lucatorto ; T. E. Madey ; S. Bajt ; M. Fang ; M. Chandhok
Pub. info.: Emerging lithographic technologies XI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6517
3.

Conference Proceedings
Conference Proceedings
3. EUV lithography program at IMEC
A. M. Goethals ; R. Jonckheere ; G. F. Lorusso ; J. Hermans ; F. V. Roey ; A. Myers ; M. Chandhok ; I. Kim ; A. Niroomand ; F. Iwamoto ; N. Stepanenko ; R. Gronheid ; B. Baudemprez ; K. Ronse
Pub. info.: Emerging lithographic technologies XI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6517
4.

Conference Proceedings
Conference Proceedings
4. Impact of line-width roughness on Intel's 65-nm process devices
M. Chandhok ; S. Datta ; D. Lionberger ; S. Vesecky
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519
5.

Conference Proceedings
Conference Proceedings
5. Radiation-induced defect formation and reactivity of model TiO2 capping layers with MMA: a comparison with Ru
B. V. Yakshinskiy ; M. N. Hedhili ; S. Zalkind ; M. Chandhok
Pub. info.: Emerging lithographic technologies XII.  1  pp.692114-1-692114-10,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6921