1.

Conference Proceedings
Conference Proceedings
1. 45nm design rule in-die overlay metrology on immersion lithography processes
Y. Shih ; G. K. Huang ; C. Yu ; M. Adel ; C. K. Huang ; P. Izikson ; E. Kassel ; S. Mathur ; C. Huang ; D. Tien ; Y. Avrahamov
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518
2.

Conference Proceedings
Conference Proceedings
2. Improved overlay control through automated high order compensation
S. Wakamoto ; Y. Ishii ; K. Yasukawa ; A. Sukegawa ; S. Maejima ; A. Kato ; J. C. Robinson ; B. J. Eichelberger ; P. Izikson ; M. Adel
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518
3.

Conference Proceedings
Conference Proceedings
3. Differential signal scatterometry overlay metrology: an accuracy investigation
D. Kandel ; M. Adel ; B. Dinu ; B. Golovanevsky ; P. Izikson ; V. Levinski ; I. Vakshtein ; P. Leray ; M. Vasconi ; B. Salski
Pub. info.: Optical Measurement Systems for Industrial Inspection V.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6616
4.

Conference Proceedings
Conference Proceedings
4. An update on the DPL overlay discontinuity
M. Adel
Pub. info.: Lithography Asia 2008.  1  pp.71400K-1-71400K-9,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7140
5.

Conference Proceedings
Conference Proceedings
5. Diffraction based overlay metrology: accuracy and performance on front end stack
P. Leray ; S. Cheng ; D. Kandel ; M. Adel ; A. Marchelli
Pub. info.: Metrology, inspection, and process control for microlithography XXII.  1  pp.69220O-1-69220O-12,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6922
6.

Conference Proceedings
Conference Proceedings
6. Diffraction order control in overlay metrology: a review of the roadmap options
M. Adel ; D. Kandel ; V. Levinski ; J. Seligson ; A. Kuniavsky
Pub. info.: Metrology, inspection, and process control for microlithography XXII.  1  pp.692202-1-692202-19,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6922
7.

Conference Proceedings
Conference Proceedings
7. The challenges of transitioning from linear to high-order overlay control in advanced lithography
M. Adel ; P. lzikson ; D. Tien ; C. K. Huang ; J. C. Robinson
Pub. info.: Quantum optics, optical data storage, and advanced microlithography : 12-14 November 2007, Beijing, China.  pp.682722-1-682722-10,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6827