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11 results

Conference Proceedings

1. In Situ Stress Measurement Method Based on X-Ray Diffraction under Biaxial Tensile Loading

D.Y. Ju ; J.G. Wang ; M. Abe

Pub. info.:	Advanced material science and technology : selected, peer reviewed papers from the 7th International Forum on Advanced Material Science and Technology, June 26-28, 2011, Dalian, China (IFAMST-7). pp.615-618, 2011. Aedermannsdorf, Switzerland. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	675-677

Conference Proceedings

2. Challenges for Improving the Crystal Quality of 3C-SiC Verified with MOSFET Performance

H. Nagasawa ; K. Yagi ; T. Kawahara ; N. Hatta ; M. Abe

Pub. info.:	Silicon carbide and related materials 2007 : selected peer reviewed papers from the International Conference on Silicon Carbide and Related Materials 2007, Otsu Prince Hotel Covention Hall, Lake Biwa Resort, Otsu, Japan, October 14-19, 2007. pp.89-94, 2009. Aedermannsdorf, Switzerland. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	600-603

Conference Proceedings

3. Effect of Nitrogen on Microstructure of Porous CoCrMo Alloy Compacts for Biomedical Applications

N. Nomura ; M. Abe ; S.H. Lee ; A. Chiba

Pub. info.:	PRICM 6 : selected, peer reviewed papers from The sixth Pacific Rim International Conference on Advanced Materials and Processing, November 5-9, 2007, ICC Jeju, Jeju Island, Korea. 561-565 pp.1501-1504, 2007. Uetikon-Zuerich. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	561-565

Conference Proceedings

4. Analysis of Residual Stress for Butt Welding of Thick Plate

M. Nakatani ; M. Abe ; H. Murakawa ; T. Sasaki

Pub. info.:	THERMEC 2009, 6th International Conference on PROCESSING & MANUFACTURING OF ADVANCED MATERIALS, Berlin, Germany, August 25-29, 2009. pp.2440-2445, 2010. Aedermannsdorf, Switzerland. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	638-642

Conference Proceedings

5. High Catalytic Activity of Palladium for Metal-Enhanced Hydrofluoric Acid Etching of Silicon

S. Yae ; M. Tashiro ; T. Hirano ; M. Abe ; N. Fukumuro

Pub. info.:	Porous semiconductors : a symposium held in memory of Vitali Parkhutik and Volker Lehmann. pp.285-289, 2008. Pennington, NJ. Electrochemical Society
Title of ser.:	ECS transactions
Ser. no.:	16(3)

Conference Proceedings

6. Preparation of Copper-Doped Nickel Oxide Thin Films by Sol-Gel Method Using Nickel and Copper Acetate

T. Ehara ; K. Sasaki ; M. Abe ; T. Nakanishi

Pub. info.:	5th Asia Conference on Mechanical and Materials Engineering. pp.213-218, 2017. Aedermannsdorf, Switzerland. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	909

Conference Proceedings

7. Thermally activated population transfer between two different off-center exciton states in KCI:I

M. Abe ; T. Matsumoto ; K. Kan'no

Pub. info.:	International Conference on Excitonic Processes in Condensed Matter : 19-22 July 1994, Darwin, Australia. pp.178-186, 1995. Bellingham, WA. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2362

Conference Proceedings

8. Hydrogen production using metal nanoparticle modified silicon thin film photoelectrode

S. Yae ; A. Onaka ; M. Abe ; N. Fukumuro ; S. Ogawa ; N. Yoshida ; S. Nonomura ; Y. Nakato ; H. Matsuda

Pub. info.:	Solar hydrogen and nanotechnology II : 27-30 August 2007, San Diego, California, USA. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6650

Conference Proceedings

9. Surface energy control techniques for photomask fabrication and their characterizations with scanning probe microscopy

M. Kurihara ; S. Hatakeyama ; K. Yoshida ; M. Abe ; D. Totsukawa

Pub. info.:	Photomask and next-generation lithography mask technology XV. 2 pp.70282T-1-70282T-7, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	7028

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Conference Proceedings

10. Optimization of measuring conditions for templates of UV nano imprint lithography

K. Yoshida ; K. Kojima ; M. Abe ; S. Sasaki ; M. Kurihara

Pub. info.:	Photomask and next-generation lithography mask technology XV. 2 pp.70281V-1-70281V-8, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	7028

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Author: M. Abe