1.

Conference Proceedings
Conference Proceedings
1. "ArF lithography: challenges, resolution capability, and the mask error enhancement function"
Plat,M.V. ; Lyons,C.F. ; Wilkison,A. ; Schefske,J.A. ; Kim,H.-E.
Pub. info.: Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK.  pp.162-169,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4404
2.

Conference Proceedings
Conference Proceedings
2. Impact of optical enhancement techniques on the mask error enhancement function(MEEF)
Plat,M.V. ; Nguyen,K.B. ; Spence,C.A. ; Lyons,C.F. ; Wilkison,A.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.206-214,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
3.

Conference Proceedings
Conference Proceedings
3. Manufacturability of the ultrathin resist process
Pike,C. ; Bell,S. ; Plat,M.V. ; King,P. ; Nguyen,K.B. ; Lyons,C.F. ; Levinson,H.J. ; Phan,K.A. ; Okoroanyanwu,U.
Pub. info.: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.328-333,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3997
4.

Conference Proceedings
Conference Proceedings
4. Deep-UV reflection control for patterning dielectric layers
Subramanian,R. ; Bains,G.S. ; Lyons,C.F. ; Singh,B. ; Gallardo,E.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.356-370,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
5.

Conference Proceedings
Conference Proceedings
5. Resolution capability and the mask error enhancement function (MEEF) for ArF and KrF lithography
Plat,M.V. ; Spence,C.A. ; Lyons,C.F. ; Wilkison,A.
Pub. info.: Optical Microlithography XIV.  4346  pp.851-857,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346