Farmer, K.R. ; Lundgren, P. ; Andersson, M.O. ; Engstrom, O.
Pub. info.:
Amorphous insulating thin films : symposium held December 1-4, 1992, Boston, Massachusetts, U.S.A.. pp.229-234, 1993. Pittsburgh, Pa.. Materials Research Society
The physics and chemistry of SiO2 and the Si-SiO2 interface-4, 2000 : proceedings of the fourth International Symposium on the Physics and Chemistry of SiO2 and the Si-SiO2 Interface, Tronto, Canada, May 15-18, 2000. pp.153-160, 2000. Pennington, N.J.. Electrochemical Society
Hurley, P. K. ; Leveugle, C. ; Mathewson, A. ; Doyle, D. ; Whiston, S. ; Prendergast, J. ; Lundgren, P.
Pub. info.:
Defect and impurity engineered semiconductors, II : symposium held April 13-17, 1998, San Francisco, California, U.S.A.. pp.659-, 1998. Warrendale, Pa. MRS - Materials Research Society
Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.. pp.451-, 1999. Warrendale, PA. MRS - Materials Research Society
Amorphous and crystalline insulating thin films--1996 : symposium held December 2-4, 1996, Boston, Massachusetts, U.S.A.. pp.35-, 1997. Pittsburgh, Pa.. MRS - Materials Research Society
Ragnarsson, L.-Å. ; Lundgren, P. ; Ovuka, Z. ; Andersson, M.O.
Pub. info.:
The physics and chemistry of SiO[2] and the Si-SiO[2] interface-3, 1996 : proceedings of the Third International Symposium on the Physics and Chemistry of SiO[2] and the Si-SiO[2] Interface. pp.667-676, 1996. Pennington, NJ. Electrochemical Society
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