1.

Conference Proceedings
Conference Proceedings
1. Combining OPC and design for printability into 65-nm logic designs
Lucas, K.D. ; Yuan, C.-M. ; Boone, R. ; Strozewski, K. ; Porter, J. ; Tian, R. ; Wimmer, K. ; Cobb, J. ; Wilkinson, B. ; Toublan, O.
Pub. info.: Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA.  pp.158-169,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5379
2.

Conference Proceedings
Conference Proceedings
2. CPL reticle technology for advanced device applications
Conley, W.E. ; Van Den Broeke, D.J. ; Socha, R.J. ; Wu, W. ; Litt, L.C. ; Lucas, K.D. ; Roman, B.J. ; Peters, R.D. ; Parker, C. ; Chen, J.F. ; Wampler, K.E. ; Laidig, T.L. ; Schaefer, E. ; Kuijten, J.-P. ; Verhappen, A. ; van de Goor, S. ; Chaplin, M. ; Kasprowicz, B.S. ; Progler, C.J. ; Robert, E. ; Thony, P. ; Hathorn, M.E.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.578-584,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
3.

Conference Proceedings
Conference Proceedings
3. CPL mask technology for sub-100-nm contact hole imaging
Kasprowicz, B.S. ; Conley, W.E. ; Litt, L.C. ; Van Den Broeke, D.J. ; Montgomery, P.K. ; Socha, R.J. ; Wu, W. ; Lucas, K.D. ; Roman, B.J. ; Chen, J.F. ; Wampler, K.E. ; Laidig, T.L. ; Progler, C.J. ; Hathorn, M.E.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.624-631,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
4.

Conference Proceedings
Conference Proceedings
4. Comparisons of 9% versus 6% transmission attenuated phase-shift mask for the 65-nm device mode
Montgomery, P.K. ; Lucas, K.D. ; Litt, L.C. ; Conley, W. ; Fanucchi, E. ; Van Wingerden, J. ; Vandenberghe, G. ; Wiaux, V. ; Taylor, D. ; Cangemi, M.J. ; Kasprowicz, B.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.814-825,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
5.

Conference Proceedings
Conference Proceedings
5. MEV as a new constraint for lithographers in the sub-100-nm regime
Trouiller, Y. ; Postnikov, S.V. ; Lucas, K.D. ; Sundermann, F. ; Patterson, K. ; Belledent, J. ; Couderc, C. ; Rody, Y.F.
Pub. info.: Optical Microlithography XVII.  pp.1081-1092,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
6.

Conference Proceedings
Conference Proceedings
6. The application of CPL reticle technology for the 0.045-mm node
Conley, W. ; Van Den Broeke, D.J. ; Socha, R.J. ; Wu, W. ; Litt, L.C. ; Lucas, K.D. ; Roman, B.J. ; Peters, R.D. ; Parker, C. ; Chen, F. ; Wampler, K.E. ; Laidig, T.L. ; Schaefer, E. ; Kuijten, J.-P. ; Verhappen, A. ; van de Goor, S. ; Chaplin, M. ; Kasprowicz, B.S. ; Progler, C.J. ; Robert, E. ; Thony, P.
Pub. info.: Optical Microlithography XVII.  pp.504-509,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
7.

Conference Proceedings
Conference Proceedings
7. The impact of MEEF through pitch for 120-nm contact holes
Litt, L.C. ; Wu, W. ; Conley, W. ; Lucas, K.D. ; Roman, B.J. ; Montgomery, P. ; Kasprowicz, B.S. ; Progler, C.J. ; Socha, R.J. ; Verhappen, A. ; Wampler, K.E. ; Schaefer, E. ; Cook, P. ; Kuijten, J.-P. ; Pijnenburg, W.
Pub. info.: Optical Microlithography XVII.  pp.1305-1314,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
8.

Conference Proceedings
Conference Proceedings
8. METROPOLE-3D: a three-dimensional electromagnetic field simulator for EUV masks under oblique illumination
Zhu, Z. ; Lucas, K.D. ; Cobb, J.L. ; Hector, S.D. ; Strojwas, A.J.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.585-594,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
9.

Conference Proceedings
Conference Proceedings
9. Cost of ownership reduction for OPC development and production
Yuan, C.-M. ; Jarvis, B. ; Lucas, K.D. ; Boone, R. ; Tian, R. ; Reich, A.
Pub. info.: Optical Microlithography XVII.  pp.1121-1129,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377