1.

Conference Proceedings
Conference Proceedings
1. Investigation of model-based physical design restrictions(Invited Paper)
Lucas, K. ; Baron, S. ; Belledent, J. ; Boone, R. ; Borjon, A. ; Couderc, C. ; Patterson, K. ; Riviere-Cazaux, L. ; Rody, Y. ; Sundermann, F. ; Toublan, O. ; Trouiller, Y. ; Urbani, J. -C. ; Wimmer, K.
Pub. info.: Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA.  pp.85-96,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5756
2.

Conference Proceedings
Conference Proceedings
2. Model-based design improvements for the 100-nm lithography generation
Lucas, K. ; Postnikov, S.V. ; Patterson, K. ; Yuan, C.-M. ; Thomas, C. ; Thompson, M.A. ; Carter, R. ; Litt, L.C. ; Montgomery, P.K. ; Wimmer, K.
Pub. info.: Optical Microlithography XV.  Part One  pp.215-226,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
3.

Conference Proceedings
Conference Proceedings
3. Lithographic process window analysis by statistical means
Bourov, A. ; Postnikov, S.V. ; Lucas, K.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part One  pp.484-491,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689
4.

Conference Proceedings
Conference Proceedings
4. Practical quality metrics for resolution enhancement software
Boone, R.E. ; Lucas, K. ; Wynd, R. ; Boatright, M. ; Thompson, M.A. ; Reich, A.J.
Pub. info.: Cost and performance in integrated circuit creation : 27-28 February 2003, Santa Clara, California, USA.  pp.162-171,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5043
5.

Conference Proceedings
Conference Proceedings
5. Investigation of product design weaknesses using model-based OPC sensitivity analysis
Postnikov, S.V. ; Lucas, K. ; Garza, C.M. ; Wimmer, K. ; LaCour, P. ; Word, J.C.
Pub. info.: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.160-171,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5042
6.

Conference Proceedings
Conference Proceedings
6. Development of a sub-100nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination
Petersen, J.S. ; Conley, W. ; Roman, B.J. ; Litt, L.C. ; Lucas, K. ; Wu, W. ; Van Den Broeke, D.J. ; Chen, J.F. ; Laidig, T.L. ; Wampler, K.E. ; Gerold, D.J. ; Maslow, M.J. ; Socha, R.J. ; van Praagh, J. ; Droste, R.
Pub. info.: Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA.  pp.298-311,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4692
7.

Conference Proceedings
Conference Proceedings
7. Generation and fusion of multiple image representations in automatic corrosion detetion algorithms used with shipboard tank video inspection systems
Nelson, B.N. ; Slebodnick, P. ; Lemieux, E.J. ; Krupa, M. ; Preisser, R. ; Lucas, K.
Pub. info.: Sensor fusion : architectures, algorithms, and applications VI : 3-5 April 2002, Orlando, USA.  pp.110-121,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4731
8.

Conference Proceedings
Conference Proceedings
8. High-NA ArF lithography for 70-nm technologies
Montgomery, P.K. ; Vandenberghe, G. ; Lucas, K.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1613-1624,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
9.

Conference Proceedings
Conference Proceedings
9. Monte Carlo method for highly efficient and accurate statistical lithography simulations
Postnikov, S.V. ; Lucas, K. ; Wimmer, K. ; Ivin, V. ; Rogov, A.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1118-1126,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
10.

Conference Proceedings
Conference Proceedings
10. 65nm OPC and design optimization by using simple electrical transistor simulation
Trouiller, Y. ; Devoivre, T. ; Belledent, J. ; Foussadier, F. ; Borjon, A. ; Patterson, K. ; Lucas, K. ; Couderc, C. ; Sundermann, F. ; Urbani, J. -C. ; Baron, S. ; Rody, Y. ; Chapon, J. -D. ; Arnaud, F. ; Entradas, J.
Pub. info.: Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA.  pp.378-388,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5756