1.

Conference Proceedings
Conference Proceedings
1. Concentration and Depth Measurements of Boron in Semiconductor Materials Using Neutron Depth Profiling
Unlu,K. ; Wehring,B.W. ; Hossain,T.Z. ; Lowell,J.K.
Pub. info.: Proceedings of the Electrochemical Society Symposium on Diagnostic Techniques for Semiconductor Materials and Devices.  pp.458-469,  1997.  Pennington, NJ.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3322
2.

Conference Proceedings
Conference Proceedings
2. Correlating EEPROM end-of-line measurements with PDM in-line charging monitoring for ion implantation
Bloot,A.S. ; Satink,E.H.J. ; Cacciato,A. ; Peuscher,H.J.F. ; Lindeman,J. ; Lowell,J.K.
Pub. info.: In-Line Characterization Techniques for Performance and Yield Enhancement in Microelectronic Manufacturing II :23-24 September 1998 Santa Clara, California.  pp.38-43,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3509
3.

Conference Proceedings
Conference Proceedings
3. Real-time on-wafer evaluation of contaminant-induced defects from resist processing
Lowell,J.K. ; Ackmann,P.W. ; Brown,S.E. ; Sherry,J. ; Hossain,T.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography X.  pp.206-216,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2725
4.

Conference Proceedings
Conference Proceedings
4. Influence of oxygen-iron interaction on the external gettering of Fe in p-Si by polycrystalline silicon film
Mishra,K.K. ; Stinson,M. ; Lowell,J.K.
Pub. info.: Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing II.  pp.121-128,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2638
5.

Conference Proceedings
Conference Proceedings
5. Evaluation of contaminant-induced charge from oxide chemical-mechanical polish
Burke,P. ; Lowell,J.K. ; Jastrzebski,L.
Pub. info.: Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing II.  pp.27-37,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2638
6.

Conference Proceedings
Conference Proceedings
6. Oxide charging induced by electron exposure in ion implant
Stuber,A. ; Lowell,J.K.
Pub. info.: Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing II.  pp.183-192,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2638
7.

Conference Proceedings
Conference Proceedings
7. Optical characterization of surface effects from Cu-contaminated SiO2/Si interfaces
Wang,X. ; Parks,H.G. ; Cariss,C. ; Lowell,J.K.
Pub. info.: Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing II.  pp.246-255,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2638