1.

Conference Proceedings
Conference Proceedings
1. Line-profile and critical-dimension correlation between a normal-incidence optical CD metrology system and SEM
Yang, W. ; Lowe-Webb, R. ; Korlahalli, R. ; Zhuang, V.G. ; Sasano, H. ; Liu, W. ; Mui, D.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part Two  pp.966-976,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689
2.

Conference Proceedings
Conference Proceedings
2. Novel diffraction-based spectroscopic method for overlay metrology
Yang, W. ; Lowe-Webb, R. ; Rabello, S. ; Hu, J. ; Lin, J.-Y. ; Heaton, J.D. ; Dusa, M.V. ; Boef, A.J. ; Schaar, M. ; Hunter, A.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.200-207,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038