1.

Conference Proceedings
Conference Proceedings
1. ADVANCED PHOTO RESIST REMOVAL USING O3 AND MOIST UPW IN SEMICONDUCTOR PRODUCTION
Philit, G. ; von Aswege, L. ; Madore, M. ; Wolke, K. ; Clech, M.-C. ; Asselin-Degrange, E. ; Chabli, A. ; Louis, D.
Pub. info.: Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium.  pp.356-361,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-26
2.

Conference Proceedings
Conference Proceedings
2. Strip Process Optimization for Porous ULK Films
Kalinowski, I.J. ; Bourlot, C. ; Marfoure, A. ; Louveau, O. ; Li, S. ; Su, J. ; Hills, G.W. ; Louis, D.
Pub. info.: Copper Interconnects, New Contact Metallurgies/Structures, and Low-K Interlevel Dielectrics : proceedings of the International Symposium.  pp.216-223,  2003.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-10