1.

Conference Proceedings
Conference Proceedings
1. Studies of nitride- and oxide-based materials as absorptive shifters for embedded attenuated phase-shifting mask in 193 nm
Lin,C. ; Chang,K. ; Lee,M. ; Loong,W.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.1153-1158,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
2.

Conference Proceedings
Conference Proceedings
2. TiSix as a new embedded material for attenuated phase-shift mask
Loong,W. ; Chen,T. ; Shy,S. ; Tseng,J. ; Lin,R.
Pub. info.: Optical Microlithography IX.  Part2  pp.524-530,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726