1.

Conference Proceedings
Conference Proceedings
1. Lithography strategy for 65-nm node (Invited Paper)
Borodovsky, Y.A. ; Schenker, R.E. ; Allen, G.A. ; Tejnil, E. ; Hwang, D.H. ; Lo, F.-C. ; Singh, V.K. ; Gleason, R.E. ; Brandenburg, J.E. ; Bigwood, R.M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.1-14,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
2.

Conference Proceedings
Conference Proceedings
2. Hard pellicle study for 157-nm lithography
Shu, E.Y. ; Lo, F.-C. ; Eschbach, F.O. ; Cotte, E.P. ; Engelstand, R.L. ; Lovell, E.G. ; Okada, K. ; Kikugawa, S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.558-569,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
3.

Conference Proceedings
Conference Proceedings
3. Development of polymer membranes for 157-nm lithography
Eschbach, F. ; Tregub, A. ; Orvek, K. ; Foster, C. ; Lo, F.-C. ; Matsukura, I. ; Tsushima, N.
Pub. info.: Optical Microlithography XVII.  pp.1627-1640,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377