1.
Conference Proceedings
Lee, T.-K. ; Wang, Y.-C. ; Chi, M. ; Lu, C.Y. ; Hsieh, C.H. ; Liu, R.G. ; Liao, H.J. ; Yang, S.S. ; Chang, C.-H.
Pub. info.:
Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA . pp.346-352, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5042
2.
Conference Proceedings
Hsieh, H.-C. ; Hung, J.C. ; Chin, A.S.J. ; Lee, S.C. ; Shin, J.J. ; Liu, R.G. ; Lin, B.J.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology X . pp.4-15, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5130
3.
Conference Proceedings
Lee, T.-K. ; Wang, Y.-C. ; Chi, M.-H. ; Lu, C.Y. ; Hsieh, C.H. ; Liu, R.G. ; Liao, H.J. ; Yang, S.S. ; Chang, C.-H.
Pub. info.:
Optical Microlithography XVI . Part One pp.450-456, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5040
4.
Conference Proceedings
Lee, T.-K. ; Wang, Y.-C. ; Chi, M.-H. ; Lu, C.Y. ; Hsieh, C.H. ; Liu, R.G. ; Liao, H.J. ; Yang, S.S. ; Chang, C.-H.
Pub. info.:
Optical Microlithography XVI . Part One pp.450-456, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5040