1.

Conference Proceedings
Conference Proceedings
1. Precision control of poly-gate CD by local OPC for elimination of microloading effect on 0.13-μm CMOS technology
Lee, T.-K. ; Wang, Y.-C. ; Chi, M. ; Lu, C.Y. ; Hsieh, C.H. ; Liu, R.G. ; Liao, H.J. ; Yang, S.S. ; Chang, C.-H.
Pub. info.: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.346-352,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5042
2.

Conference Proceedings
Conference Proceedings
2. Mask cost and cycle time reduction (Invited Paper)
Hsieh, H.-C. ; Hung, J.C. ; Chin, A.S.J. ; Lee, S.C. ; Shin, J.J. ; Liu, R.G. ; Lin, B.J.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.4-15,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
3.

Conference Proceedings
Conference Proceedings
3. Precision control of poly-gate CD by local OPC for elimination of microloading effect on 0.13-μm CMOS technology
Lee, T.-K. ; Wang, Y.-C. ; Chi, M.-H. ; Lu, C.Y. ; Hsieh, C.H. ; Liu, R.G. ; Liao, H.J. ; Yang, S.S. ; Chang, C.-H.
Pub. info.: Optical Microlithography XVI.  Part One  pp.450-456,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
4.

Conference Proceedings
Conference Proceedings
4. Pecision control of poly-gate CD by local OPC for elimination of microloading effect on 0.13-Цm CMOS technology
Lee, T.-K. ; Wang, Y.-C. ; Chi, M.-H. ; Lu, C.Y. ; Hsieh, C.H. ; Liu, R.G. ; Liao, H.J. ; Yang, S.S. ; Chang, C.-H.
Pub. info.: Optical Microlithography XVI.  Part One  pp.450-456,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040