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Conference Proceedings

1. Scatterometry for shallow trench isolation (STI) process metrology

Raymond,C.J. ; Littau,M.E. ; Markle,R.J. ; Purdy,M.A.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XV. pp.716-725, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4344

Conference Proceedings

2. Gauge control for sub-170-nm DRAM product features

Lafferty,N. ; Gould,C.J. ; Littau,M.E. ; Raymond,C.J.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XV. pp.454-461, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4344

Conference Proceedings

3. Asymmetric line profile measurement using angular scatterometry

Raymond,C.J. ; Littau,M.E. ; Pitts,T. ; Nagy,P.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XV. pp.436-446, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4344