1.

Conference Proceedings
Conference Proceedings
1. Model-based design improvements for the 100-nm lithography generation
Lucas, K. ; Postnikov, S.V. ; Patterson, K. ; Yuan, C.-M. ; Thomas, C. ; Thompson, M.A. ; Carter, R. ; Litt, L.C. ; Montgomery, P.K. ; Wimmer, K.
Pub. info.: Optical Microlithography XV.  Part One  pp.215-226,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
2.

Conference Proceedings
Conference Proceedings
2. Evaluation and characterization of flare in ArF lithography
Litt, L.C. ; Bourov, A. ; La Fontaine, B. ; Apelgren, E.M.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1442-1452,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
3.

Conference Proceedings
Conference Proceedings
3. Development of a sub-100nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination
Petersen, J.S. ; Conley, W. ; Roman, B.J. ; Litt, L.C. ; Lucas, K. ; Wu, W. ; Van Den Broeke, D.J. ; Chen, J.F. ; Laidig, T.L. ; Wampler, K.E. ; Gerold, D.J. ; Maslow, M.J. ; Socha, R.J. ; van Praagh, J. ; Droste, R.
Pub. info.: Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA.  pp.298-311,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4692
4.

Conference Proceedings
Conference Proceedings
4. Effect of quartz phase etch on 193-nm alternating phase-shift mask performance for the 100- nm node
Patterson, K. ; Litt, L.C. ; Maltabes, J.G. ; Hughes, G.P. ; Robertson, T. ; Montgomery, B.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1033-1040,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
5.

Conference Proceedings
Conference Proceedings
5. Comparisons of 9% versus 6% transmission attenuated phase-shift mask for the 65-nm device mode
Montgomery, P.K. ; Lucas, K.D. ; Litt, L.C. ; Conley, W. ; Fanucchi, E. ; Van Wingerden, J. ; Vandenberghe, G. ; Wiaux, V. ; Taylor, D. ; Cangemi, M.J. ; Kasprowicz, B.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.814-825,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
6.

Conference Proceedings
Conference Proceedings
6. RET integration of CPL technology for random logic
Hsu, S.D. ; Van Den Broeke, D.J. ; Chen, J.F. ; Shi, X. ; Hsu, M. ; Laidig, T.L. ; Conley, W. ; Litt, L.C. ; Wu, W.
Pub. info.: Optical Microlithography XVII.  pp.510-526,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
7.

Conference Proceedings
Conference Proceedings
7. Defect printability in CPL mask technology
Kuijten, J.-P. ; Verhappen, A. ; Pijnenburg, W. ; Conley, W. ; Litt, L.C. ; Wu, W. ; Montgomery, P. ; Roman, B.J. ; Kasprowicz, B.S. ; Progler, C.J. ; Socha, R.J. ; Van Den Broeke, D.J. ; Schaefer, E. ; Cook, P.
Pub. info.: Optical Microlithography XVII.  pp.1032-1039,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
8.

Conference Proceedings
Conference Proceedings
8. CPL mask technology for sub-100-nm contact hole imaging
Kasprowicz, B.S. ; Conley, W.E. ; Litt, L.C. ; Van Den Broeke, D.J. ; Montgomery, P.K. ; Socha, R.J. ; Wu, W. ; Lucas, K.D. ; Roman, B.J. ; Chen, J.F. ; Wampler, K.E. ; Laidig, T.L. ; Progler, C.J. ; Hathorn, M.E.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.624-631,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
9.

Conference Proceedings
Conference Proceedings
9. CPL reticle technology for advanced device applications
Conley, W.E. ; Van Den Broeke, D.J. ; Socha, R.J. ; Wu, W. ; Litt, L.C. ; Lucas, K.D. ; Roman, B.J. ; Peters, R.D. ; Parker, C. ; Chen, J.F. ; Wampler, K.E. ; Laidig, T.L. ; Schaefer, E. ; Kuijten, J.-P. ; Verhappen, A. ; van de Goor, S. ; Chaplin, M. ; Kasprowicz, B.S. ; Progler, C.J. ; Robert, E. ; Thony, P. ; Hathorn, M.E.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.578-584,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
10.

Conference Proceedings
Conference Proceedings
10. The application of CPL reticle technology for the 0.045-mm node
Conley, W. ; Van Den Broeke, D.J. ; Socha, R.J. ; Wu, W. ; Litt, L.C. ; Lucas, K.D. ; Roman, B.J. ; Peters, R.D. ; Parker, C. ; Chen, F. ; Wampler, K.E. ; Laidig, T.L. ; Schaefer, E. ; Kuijten, J.-P. ; Verhappen, A. ; van de Goor, S. ; Chaplin, M. ; Kasprowicz, B.S. ; Progler, C.J. ; Robert, E. ; Thony, P.
Pub. info.: Optical Microlithography XVII.  pp.504-509,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377