1.

Conference Proceedings
Conference Proceedings
1. Application of scatterometry for CD and profile metrology in 193-nm lithography process development
Chen, L.-J. ; Ke, C.-M. ; Yu, S.S. ; Gau, T.-S. ; Chen, P. ; Ku, Y.-C. ; Lin, B.J. ; Engelhard, D. ; Hetzer, D. ; Yang, J.Y. ; Barry, K.A. ; Yap, L. ; Yang, W.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.568-576,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
2.

Conference Proceedings
Conference Proceedings
2. Characterization of charging in CD-SEM for 90-nm metrology and beyond
Chen, L.-J. ; Lin, S.-W. ; Gau, T.-S. ; Lin, B.J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.166-176,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
3.

Conference Proceedings
Conference Proceedings
3. Pattern-dependence optical phase effect on alternating phase shift mask
Chang, B.-C. ; You, J.-W. ; Lu, M. ; Lee, C.-L. ; Kung, L.-W. ; Shu, K.-C. ; Shin, J.-J. ; Gau, T.-S. ; Lin, B.J.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.745-755,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
4.

Conference Proceedings
Conference Proceedings
4. Mask cost and cycle time reduction (Invited Paper)
Hsieh, H.-C. ; Hung, J.C. ; Chin, A.S.J. ; Lee, S.C. ; Shin, J.J. ; Liu, R.G. ; Lin, B.J.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.4-15,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
5.

Conference Proceedings
Conference Proceedings
5. Alt- PSM of contact with phase-assist feature for 65-nm node
You, J.-W. ; Shin, J.-J. ; Chang, C.-H. ; Kung, L.-W. ; Chang, B.-C. ; Dai, C.-M. ; Gau, T.-S. ; Lin, B.J.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1263-1272,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
6.

Conference Proceedings
Conference Proceedings
6. Effect of various ArF resist shrinkage amplitudes on CD bias
Ke, C.-M. ; Gau, T.-S. ; Chen, P.-H. ; Yen, A. ; Lin, B.J. ; Otaka, T. ; Iizumi, T. ; Sasada, K. ; Ueda, K.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part Two  pp.997-1006,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689
7.

Conference Proceedings
Conference Proceedings
7. Semiconductor foundry, lithography,and partners (Plenary Paper)
Lin, B.J.
Pub. info.: Emerging Lithographic Technologies VI.  Part One  pp.11-24,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4688
8.

Conference Proceedings
Conference Proceedings
8. Model-based OPC for 0.13-μm contacts using 248-nm Att PSM
Shin, J.-J. ; Wu, T.C. ; Chen, C.-K. ; Liu, R.-G. ; Ku, Y.C. ; Lin, B.J.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1296-1307,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
9.

Conference Proceedings
Conference Proceedings
9. 90-nm lithography process characterization using ODP scatterometry technology
Ke, C.-M. ; Yu, S.-S. ; Wang, Y.-H. ; Chou, Y.-J. ; Chen, J.-H. ; Lee, B.-H. ; Chu, H.-Y. ; Lin, H.-T. ; Gau, T.-S. ; Lin, C.-H. ; Ku, Y.-C. ; Lin, B.J. ; Huang, J. ; Hsu, J.J. ; Liu, V. ; Hetzer, D. ; Yap, L. ; Yang, W. ; Araki, K.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.597-604,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
10.

Conference Proceedings
Conference Proceedings
10. Global CD uniformity improvement using dose modulation and pattern correction of pattern density-dependent and position-dependent errors
Chen, C.-J. ; Lee, H.-C. ; Yeh, L.-C. ; Liu, K.-C. ; Lien, T.-C. ; Chuo, Y.-C. ; Hsieh, H.-C. ; Lin, B.J.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.28-37,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446