1.

Conference Proceedings
Conference Proceedings
1. Determination of mask induced polarization effects occurring in hyper NA immersion lithography
Huang, W. C. ; Lai, C. M. ; Luo, B. ; Tsai, C. K. ; Tsay, C. S. ; Lai, C. W. ; Kuo, C. C. ; Liu, R. G. ; Lin, H. T. ; Lin, B. J.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.543-554,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. Second generation fluids for 193 nm immersion lithography
Yu, S.-S. ; Lin, B. J.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.427-434,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
3.

Conference Proceedings
Conference Proceedings
3. Liquid immersion lithography at 157 nm
Chen, C.-K. ; Gau, T.-S. ; Shiu, L.-H. ; Lin, B. J.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.435-446,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
4.

Conference Proceedings
Conference Proceedings
4. Multi-Layer Resist Systems
Lin, B. J.
Pub. info.: Introduction to microlithography : theory, materials, and processing.  pp.287-,  1983.  Washington, D.C..  American Chemical Society
Title of ser.: ACS symposium series
Ser. no.: 219
5.

Conference Proceedings
Conference Proceedings
5. Systematic optimization of the thin-film stack by minimizing CD sensitivity [6154-154]
Lin, S. S. ; Lin, B. J. ; Yen, A. ; Ke, C. -M.
Pub. info.: Optical Microlithography XIX.  pp.615440-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
6.

Conference Proceedings
Conference Proceedings
6. Watermark defect formation and removal for immersion lithography [6154-44]
Chang, C. Y. ; Yu, D. C. ; Lin, J. C. H. ; Lin, B. J.
Pub. info.: Optical Microlithography XIX.  pp.615417-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
7.

Conference Proceedings
Conference Proceedings
7. Defect dispositiong using mask printability analysis on alternating phase-shifting masks
Chang, C.-H. ; Hsieh, C.-H. ; Tzu, S.-D. ; Dai, C.-M. ; Lin, B. J. ; Pang, L. ; Qian, Q.-D. ; Chen, J.-H. ; Huang, J. H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.622-629,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
8.

Conference Proceedings
Conference Proceedings
8. Phase-defocus windows for alternating phase-shifting mask
Liang, F. -J. ; Chen, C. -K. ; Shin, J. -J. ; You, J. -W. ; Lin, C. -H. ; Pan, Z. -Y. ; Shu, K. -C. ; Gau, T. -S. ; Lin, B. J.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.406-415,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567