1.

Conference Proceedings
Conference Proceedings
1. Failure prediction across process window for robust OPC
Shang, S.D. ; Granik, Y. ; Cobb, N.B. ; Maurer, W. ; Cui, Y. ; Liebmann, L.W. ; Oberschmidt, J.M. ; Singh, R.N. ; Vampatella, B.R.
Pub. info.: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.376-385,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5042
2.

Conference Proceedings
Conference Proceedings
2. High-performance circuit design for the RET-enabled 65-nm technology node
Liebmann, L.W. ; Barish, A.E. ; Baum, Z. ; Bonges, H.A. ; Bukofsky, S.J. ; Fonseca, C.A. ; Halle, S.D. ; Northrop, G.A. ; Runyon, S.L. ; Sigal, L.
Pub. info.: Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA.  pp.20-29,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5379
3.

Conference Proceedings
Conference Proceedings
3. Enabling the 70-nm technology nobe with 193-nm altPSM lithography(Invited Paper)
Liebmann, L.W. ; Lund, J. ; Graur, I.C. ; Heng, F.-L. ; Fonseca, C.A. ; Culp, J. ; Gabor, A.H.
Pub. info.: Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA.  pp.262-273,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4692
4.

Conference Proceedings
Conference Proceedings
4. Layout optimization at the pinnacle of optical lithography (Invited Paper)
Liebmann, L.W. ; Northrop, G.A. ; Culp, J. ; Sigal, L. ; Barish, A. ; Fonseca, C.A.
Pub. info.: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.1-14,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5042
5.

Conference Proceedings
Conference Proceedings
5. Is model-based optical proximity correction ready for manufacturing? Study on 0.12- and 0.175-μm DRAM technology
Cui, Y. ; Zach, F.X. ; Butt, S. ; Li, W.-K. ; Liegl, B. ; Liebmann, L.W.
Pub. info.: Optical Microlithography XV.  Part One  pp.67-75,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
6.

Conference Proceedings
Conference Proceedings
6. Subresolution assist feature implementation for high-performance logic gate-level lithography
Gabor, A.H. ; Bruce, J. ; Chu, W. ; Ferguson, R. ; Fonseca, C.A. ; Gordon, R.L. ; Jantzen, K. ; Khare, M. ; Lavin, M. ; Lee, W.-H. ; Liebmann, L.W. ; Muller, k.P. ; Rankin, J. ; Varekamp, P. ; Zach, F.X.
Pub. info.: Optical Microlithography XV.  Part One  pp.418-425,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
7.

Conference Proceedings
Conference Proceedings
7. Failure prediction across process window for robust OPC
Shang, S.D. ; Granik, Y. ; Cobb, N.B. ; Maurer, W. ; Cui, Y. ; Liebmann, L.W. ; Oberschmidt, J.M. ; Singh, R.N. ; Vampatella, B.R.
Pub. info.: Optical Microlithography XVI.  Part One  pp.431-440,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
8.

Conference Proceedings
Conference Proceedings
8. Methodology for generating exposure tool specifications for alternating phase-shift mask application for 70-nm node
Lai, K. ; Gallatin, G.M. ; Rosenbluth, A.E. ; Fonseca, C.A. ; Liebmann, L.W. ; Progler, C.J.
Pub. info.: Optical Microlithography XV.  Part One  pp.336-347,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691