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14 results

Conference Proceedings

1. Damage testing of pellicles for 193-nm lithography

Liberman,V. ; Kunz,R.R. ; Rothschild,M. ; Sedlacek,J.H.C. ; Uttaro,R.S. ; Grenville,A. ; Bates,A.K. ; Van,Peski,C.K.

Pub. info.:	Optical microlithography XI : 25-27 February 1998, Santa Clara, California. pp.480-495, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3334

Conference Proceedings

2. Long-term 193-nm laser-induced degradation of fused silica and calcium fluoride

Liberman,V. ; Rothschild,M. ; Sedlacek,J.H.C. ; Uttaro,R.S. ; Bates,A.K. ; Peski,C.K.Van

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part2 pp.1137-1145, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

Conference Proceedings

3. Determination of optical properties of thin films and surfaces in 157-nm lithography

Liberman,V. ; Bloomstein,T.M. ; Rothschild,M.

Pub. info.:	Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California. pp.480-491, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3998

Conference Proceedings

4. Long-term testing of optical components for 157-nm lithography

Liberman,V. ; Rothschild,M. ; Sedlacek,J.H.C. ; Uttaro,R.S. ; Bates,A.K. ; Orvek,K.J.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.488-495, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

5. Experimentation and modeling of organic photocontamination on lithographic optics

Kunz,R.R. ; Liberman,V. ; Downs,D.K.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.474-487, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

6. Laser cleaning of optical elements in 157-nm lithography

Bloomstein,T.M. ; Rothschild,M. ; Liberman,V. ; Hardy,D.E. ; Efremow,N.N.,Jr. ; Palmacci,S.T.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part2 pp.1537-1545, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

7. Optical materials and coatings at 157 nm

Bloomstein,T.M. ; Liberman,V. ; Rothschild,M. ; Hardy,D.E. ; Goodman,R.B.

Pub. info.:	Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California. Part1 pp.342-349, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3676

Conference Proceedings

8. Assessment of optical coatings for 193-nm lithography

Liberman,V. ; Rothschild,M. ; Sedlacek,J.H.C. ; Uttaro,R.S. ; Grenville,A. ; Bates,A.K. ; Van,Peski,C.K.

Pub. info.:	Optical microlithography XI : 25-27 February 1998, Santa Clara, California. pp.470-479, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3334

Conference Proceedings

9. Controlled contamination of optics under 157-nm laser irradiation

Bloomstein,T.M. ; Liberman,V. ; Palmacci,S.T. ; Rothschild,M.

Pub. info.:	Optical Microlithography XIV. 4346 pp.685-694, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

10.

Conference Proceedings

10. UV cleaning of contaminated 157-nm reticles

Bloomstein,T.M. ; Liberman,V. ; Rothschild,M. ; Efremow Jr.,N.N. ; Hardy,D.E. ; Palmacci,S.T.

Pub. info.:	Optical Microlithography XIV. 4346 pp.669-675, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

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Author: Liberman,V.