1.

Conference Proceedings
Conference Proceedings
1. Study of lag effect in LPHD plasma etching ofSi for MEMS applications by variable time steps in numerical methods [6032-17]
Zhang, J. ; Huang, -A. Q. ; Li, -H. W.
Pub. info.: ICO20 : MEMS, MOEMS, and NEMS : 21-26 August, 2005, Changchun, China.  pp.60320H-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6032
2.

Conference Proceedings
Conference Proceedings
2. Negative chemical amplification process simulation in integrated circuits and microelectomechanical systems fabrication [6032-15]
Zhou, -F. Z. ; Huang, -A. Q. ; Li, -H. W. ; Lu, W. ; Southeast Univ. (China)
Pub. info.: ICO20 : MEMS, MOEMS, and NEMS : 21-26 August, 2005, Changchun, China.  pp.60320F-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6032
3.

Conference Proceedings
Conference Proceedings
3. An ICP etch model based on time multiplexed deep etching [6032-16]
Zhang, J. ; Huang, -A. Q. ; Li, -H. W.
Pub. info.: ICO20 : MEMS, MOEMS, and NEMS : 21-26 August, 2005, Changchun, China.  pp.60320G-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6032