1.

Conference Proceedings
Conference Proceedings
1. HF IN SITU TANK USED IN HF-LAST CLEAMNG
Patruno, P. ; Levy, D. ; Fleury, A. ; Tonti, A. ; Tardif, F.
Pub. info.: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.195-205,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-7
2.

Conference Proceedings
Conference Proceedings
2. Electrical Characterization of Thin Oxide Layers by Impedance Spectroscopy Using SiliconlOxidefElectrolyte (SOE) Structures
Chemla, M. ; Bertagna, V. ; Erre, R. ; Rouclle, F. ; Petitdidier, S. ; Levy, D.
Pub. info.: Silicon nitride and silicon dioxide thin insulating films VII : proceedings of the international symposium.  pp.452-464,  2003.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-2
3.

Conference Proceedings
Conference Proceedings
3. A Neutron Reflectivity Study of Silicon Oxide Thin Films
Bertagna, V. ; Menelle, A. ; Petitdidier, S. ; Levy, D. ; Saboungi, M.-L
Pub. info.: Silicon nitride and silicon dioxide thin insulating films VII : proceedings of the international symposium.  pp.525-532,  2003.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-2
4.

Conference Proceedings
Conference Proceedings
4. THE CONTROL OF DISSOLVED GASES IN AQUEOUS-BASED SEMICONDUCTOR PROCESSING
Levy, D. ; Tardif, F. ; Maunier, F. ; Pizzetti, C. ; Christenson, K.
Pub. info.: Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium.  pp.121-128,  1999.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-36
5.

Conference Proceedings
Conference Proceedings
5. CHEMICAL OXIDE CHARACTERIZATION
Paillet, C. ; Joly, J.P. ; Tardif, F. ; Barla, K. ; Patruno, P. ; Levy, D.
Pub. info.: Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.366-370,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-20
6.

Conference Proceedings
Conference Proceedings
6. In situ Cure Monitoring for Quality and Process Control
Kranbuehl, D. E. ; Levy, D. ; Williamson, A. ; hart, S. M. ; Loos, A. C. ; Weideman, M. H. ; Long, E.
Pub. info.: In search of excellence : conference proceedings : ANTEC '91, Montreal.  pp.941-945,  1991.  Brookfield Center, CT.  Society of Plastics Engineers, Inc. (SPE)
Title of ser.: Annual Technical Conference - ANTEC : Society of Plastics Engineers Annual Technical Papers
Ser. no.: 37
7.

Conference Proceedings
Conference Proceedings
7. 09-P-09 - Structural modifications induced by high pressure in scolecite and heulandite: in-situ synchrotron X-ray powder diffraction study
Vezzalini, G. ; Quartieri, S. ; Sani, A. ; Levy, D.
Pub. info.: Zeolites and mesoporous materials at the dawn of the 21st century : proceedings of the 13th International Zeolite Conference, Montpellier, France, 8-13 July 2001.  pp.289-289,  2001.  Amsterdam.  Elsevier
Title of ser.: Studies in surface science and catalysis
Ser. no.: 135
8.

Conference Proceedings
Conference Proceedings
8. PREVENTION OF Si ETCHING IN DILUTED SC1 SOLUTIONS
Bellandi, E. ; Alessandri, M. ; Lodi, D. ; Strada, M. ; Pipia, S. ; Petitdidier, S. ; Levy, D.
Pub. info.: Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium.  pp.337-344,  2001.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2001-26
9.

Conference Proceedings
Conference Proceedings
9. ELECTROCHEMICAL STUDY OF ULTRA-THIN SILICON OXIDES
Bertagna, V. ; Erre, R. ; Petitdidier, S. ; Levy, D. ; Chemla, M.
Pub. info.: Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium.  pp.211-218,  2001.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2001-26
10.

Conference Proceedings
Conference Proceedings
10. IMPACT STUDY OF THE USE OF ULSI, VLSI AND MOS GRADE CHEMICALS IN THE RCA CLEANING PROCESS ON MOS AND BIPOLAR DEVICES
Tardif, F. ; Joly, J.P. ; Lardin, T. ; Tonti, A. ; Patruno, P. ; Levy, D. ; Sievert, W.
Pub. info.: Proceedings of the Satellite Symposium to ESSDERC 93 Grenoble/France : crystalline defects and contamination: their impact and control in device manufacturing.  pp.114-122,  1993.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1993-15