Inverse lithography technology at chip scale [6154-41]
- Author(s):
Lin, B. ( United Microelectronic Corp. (Taiwan) ) Shieh, M. F. ( United Microelectronic Corp. (Taiwan) ) Sun, J. ( United Microelectronic Corp. (Taiwan) ) Ho, J. ( Xilinx Inc. (USA) ) Wang, Y. ( Xilinx Inc. (USA) ) Wu, X. ( Xilinx Inc. (USA) ) Leitermann, W. ( Xilinx Inc. (USA) ) Lin, O. ( Toppan Chunghwa Electronics (Taiwan) ) Lin, J. ( Toppan Chunghwa Electronics (Taiwan) ) Liu, Y. ( Luminescent Technologies, Inc. (USA) ) Pang, L. ( Luminescent Technologies, Inc. (USA) ) - Publication title:
- Optical Microlithography XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6154
- Pub. Year:
- 2006
- Pt.:
- 1
- Page(from):
- 615414
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461971 [0819461970]
- Language:
- English
- Call no.:
- P63600/6154
- Type:
- Conference Proceedings
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