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Symmetry enhancement method for process modeling and its applications in IC design and OPC

Author(s):
Publication title:
Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4692
Pub. Year:
2002
Page(from):
465
Page(to):
470
Pages:
6
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444394 [0819444391]
Language:
English
Call no.:
P63600/4692
Type:
Conference Proceedings

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