1.

Conference Proceedings
Conference Proceedings
1. MECHANISM OF DRY ETCHING OF SILICON DIOXIDE: A CASE OF DIRECT REACTIVE ION ETCHING
Steinbruchel, Ch. ; Lehmann, H. W. ; Frick, K.
Pub. info.: Plasma synthesis and etching of electronic materials : symposium held November 27-30, 1984, Boston, Massachusetts, U.S.A..  pp.157-162,  1985.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 38
2.

Conference Proceedings
Conference Proceedings
2. Magnetron dry etching for photonic device fabrication
Arnot, H. E. G. ; Zappe, H. P. ; Epler, J. E. ; Graf, B. ; Widmer, R. ; Lehmann, H. W.
Pub. info.: III-V electronic and photonic device fabrication and performance : symposium held April 12-15, 1993, San Francisco, California, U.S.A..  pp.177-,  1993.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 300