1.

Conference Proceedings
Conference Proceedings
1. AlxGa1-xN p-i-n photodiodes on sapphire substrates
Walker,D. ; Kung,P. ; Sandvik,P. ; Wu,J.-J. ; Hamilton,M. ; Lee,I.-H. ; Diaz,J. ; Razeghi,M.
Pub. info.: Photodetectors : materials and devices IV : 27-29 January 1999, San Jose, California.  pp.193-198,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3629
2.

Conference Proceedings
Conference Proceedings
2. Schottky MSM photodetectors on GaN films grown on sapphire by lateral epitaxial overgrowth
Kung,P. ; Walker,D. ; Sandvik,P. ; Hamilton,M. ; Diaz,J. ; Lee,I.-H. ; Razeghi,M.
Pub. info.: Photodetectors : materials and devices IV : 27-29 January 1999, San Jose, California.  pp.223-229,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3629
3.

Conference Proceedings
Conference Proceedings
3. Effective OPC pattern generation using chemically amplified resist 0.13-ｦﾌm design rule masks
Lee,I.-H. ; Nam,K.-H. ; Kim,H.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.705-715,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066
4.

Conference Proceedings
Conference Proceedings
4. Universal inspection standard for evaluation of inspection system and algorithm sensitivity and runability
Chen,J.X. ; Howard,C.H. ; Son,K. ; Kalk,F.D. ; Lee,I.-H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.327-337,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066
5.

Conference Proceedings
Conference Proceedings
5. Application of deep-UV attenuated PSM to 0.2-ｦﾌm contact hole patterning technology
Lee,I.-H. ; Kim,S.-M. ; Ahn,C.-N. ; Biak,K.-H.
Pub. info.: 16th Annual BACUS Symposium on Photomask Technology and Management.  pp.392-402,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2884