Nanotechnology in mesostructured materials : proceedings of the 3rd International Mesostructured Materials Symposium, Jeju, Korea, July 8-11, 2002. pp.85-88, 2003. Amsterdam. Elsevier
Kim, D.-W. ; Lee, J.-K. ; Koo, S.H. ; Lee, D.-H. ; Kim, J.-M. ; Choi, S.-S.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology X. pp.484-495, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Lee, J.-K. ; Kim, D.-W. ; Shin, K.-M. ; Lee, D.-H. ; Kim, J.-M. ; Choi, S.-S.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology X. pp.439-445, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Shin, K.M. ; Kim, D.-W. ; Lee, J.-K. ; Lee, D.-H. ; Kim, J.-M. ; Choi, S.-S.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology XI. pp.330-341, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering