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11 results

Conference Proceedings

1. High-performance e-beam resist coupling excellent dry etch resistance and sub-100-nm resolution for advanced mask and device making

Huang,W.-S. ; Kwong,R.W. ; Moreau,W.M. ; Lang,R. ; Robinson,C.F. ; Medeiros,D.R. ; Petrillo,K.E. ; Aviram,A. ; Mahorowala,A.P. ; Angelopoulos,M. ; Magg,C. ; Lawliss,M. ; Faure,T.B.

Pub. info.:	Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA. pp.268-277, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4343

Conference Proceedings

2. Evaluation and comparison of the pattern transfer-induced image placement distortions on e-beam projection lithography masks

Magg,C. ; Lercel,M.J. ; Lawliss,M. ; Ackel,R. ; Caldwell,N. ; Kindt,L. ; Racette,K.C. ; Williams,C. ; Reu,P.L.

Pub. info.:	Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA. pp.374-382, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4343

Conference Proceedings

3. Next-generation lithography mask development at the NGL Mask Center of Competency

Lercel,M.J. ; Brooks,C.J. ; Racette,K.C. ; Magg,C. ; Lawliss,M. ; Caldwell,N. ; Jeffer,R. ; Collins,K.W. ; Barrett,M. ; Nash,S.C. ; Trybendis,M.J. ; Bouchard,L.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part2 pp.804-813, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

4. CA resist with high sensitivity and sub-100-nm resolution for advanced mask and device making

Kwong,R.W. ; Huang,W.-S. ; Hartley,J.G. ; Moreau,W.M. ; Robinson,C. ; Angelopoulos,M. ; Magg,C. ; Lawliss,M.

Pub. info.:	Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA. pp.352-360, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3997

Conference Proceedings

5. Performance of the EL-4+ maskwriter for advanced chrome on glass reticles

Caldwell,N. ; Jeffer,R. ; Lawliss,M. ; Hartley,J.G.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part1 pp.493-500, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

6. X-ray mask image-placement studies at the Microlithography Mask Development Center

Puisto,D. ; Lawliss,M. ; Faure,T. ; rocque,J.M. ; Kimmel,K.R. ; Benoit,D.E.

Pub. info.:	Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California. pp.204-210, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2723

Conference Proceedings

7. CA resist with high sensitivity and sub-100-nm resolution for advanced mask making

Huang,W.-S. ; Kwong,R.W. ; Hartley,J.G. ; Moreau,W.M. ; Angelopoulos,M. ; Magg,C. ; Lawliss,M.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VII. pp.150-159, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4066

Conference Proceedings

8. Next-generation lithography mask development at the NGL-MCOC

Lercel,M.J. ; Racette,K.C. ; Magg,C. ; Lawliss,M. ; Collins,K.W. ; Barrett,M. ; Trybendis,M.J. ; Bouchard,L.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VII. pp.105-115, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4066

Conference Proceedings

9. Evaluation of an advanced chemically amplified resist for next-generation lithography mask fabrication

Magg,C. ; Lercel,M.J. ; Lawliss,M. ; Kwong,R.W. ; Huang,W.-S. ; Angelopoulos,M.

Pub. info.:	20th Annual BACUS Symposium on Photomask Technology. pp.707-716, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4186

10.

Conference Proceedings

10. UV inspection of EUV and SCALPEL reticles

Pettibone,D.W. ; Bareket,N. ; Liang,T. ; Stivers,A.R. ; Hector,S.D. ; Mangat,P.J.S. ; Resnick,D.J. ; Lercel,M.J. ; Lawliss,M. ; Magg,C. ; Novembre,A.E. ; Farrow,R.C.

Pub. info.:	20th Annual BACUS Symposium on Photomask Technology. pp.241-249, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4186

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Author: Lawliss,M.