1.

Conference Proceedings
Conference Proceedings
1. REDUCTION OF SURFACE METALLIC CONTAMINATION THROUGH OPTIMIZED RINSING AND SINGLE-WAFER DRYING
Fyen, W. ; Holsteyns, F. ; Lauerhaas, J. ; Bearda, T. ; Mertens, P. ; Heyns, M.
Pub. info.: Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium.  pp.91-101,  2001.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2001-26
2.

Conference Proceedings
Conference Proceedings
2. SUB 1OOnm PARTICLE REMOVAL WITH DEIONIZED WATER AND A MEGASONIC FREQUENCY OF 835kHz
Lauerhaas, J. ; Wu, Y. ; Xu, K. ; Vereecke, G. ; Vos, R. ; Kenis, K. ; Mertens, P. ; Nicolosi, T. ; Heyns, M.
Pub. info.: Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium.  pp.147-155,  2001.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2001-26