Huang, L.J. ; Kwok, R.W.M. ; Lau, W.M. ; Tang, H.T. ; Lennard, W.N. ; Mitchell, I.V. ; Schultz, Peter J. ; Landheer, D.
Pub. info.:
Amorphous insulating thin films : symposium held December 1-4, 1992, Boston, Massachusetts, U.S.A.. pp.595-600, 1993. Pittsburgh, Pa.. Materials Research Society
Botton, G.A. ; Romain, E. ; Landheer, D. ; Wu, X. ; Wu, M.-Y. ; Lee, M. ; Lu, Z.-H.
Pub. info.:
Silicon nitride and silicon dioxide thin insulating films VII : proceedings of the international symposium. pp.251-261, 2003. Pennington, N.J.. Electrochemical Society
Proceedings of the third Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films. pp.414-424, 1994. Pennington, NJ. Electrochemical Society
Landheer, D. ; Gupta, J. ; Hulse, J. ; Sproule, I. ; McCaffrey, J. ; Graham, M. ; Yang, K.-C. ; Lu, Z. ; Lennard, W.N.
Pub. info.:
Low and high dielectric constant materials : materials science, processing, and reliability issues : proceedings of the fifth international symposium. pp.193-204, 2000. Pennington, N.J.. Electrochemical Society
Silicon nitride and silicon dioxide thin insulating films, proceedings of the fifth International Symposium. pp.75-89, 1999. Pennington, New Jersey. Electrochemical Society
Compound semiconductor surface passivation and novel device processing : symposium held April 5-7, 1999, San Francisco, California, U.S.A.. pp.253-258, 1999. Warrendale, Pa.. Materials Research Society