1.

Conference Proceedings
Conference Proceedings
1. Atomic Layer Deposition of Hafnium Based Gate Dielectric Layers for CMOS Applications
A. Delabie ; L. Nyns ; F. Bellenger ; M. Caymax ; T. Conard
Pub. info.: Atomic layer deposition applications 3.  pp.227-241,  2007.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 11(7)
2.

Conference Proceedings
Conference Proceedings
2. HfO2 Atomic Layer Deposition Using HfCl4/H2O: The First Reaction Cycle
L. Nyns ; A. Delabie ; M. Caymax ; M.M. Heyns ; S. Van Elshocht
Pub. info.: Atomic layer deposition applications 4.  pp.257-267,  2007.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 16(4)
3.

Conference Proceedings
Conference Proceedings
3. Replacing SiO2 - Material and Processing Aspects of New Dielectrics
S. de Gendt ; C. Adelmann ; A. Delabie ; L. Nyns ; G. Pourtois
Pub. info.: Dielectrics for nanosystems 3: materials science, processing, reliability, and manufacturing.  pp.3-13,  2008.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 13(2)
4.

Conference Proceedings
Conference Proceedings
4. Atomic Layer Deposition of HfO2 on (100) and (110) Oriented Silicon Surfaces
L. Nyns ; L. Ragnarsson ; L. Hall ; A. Delabie ; M. Heyns
Pub. info.: Physics and technology of high-k gate dielectrics 5.  pp.73-77,  2007.  Pennington, NJ.  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 11(4)