1.

Conference Proceedings
Conference Proceedings
1. Plasma-induced charging damage in P+-Polysilicon PMOSFETs
Lu,I.M. ; Chen,Y.Y. ; Joshi,A.B. ; Kwong,D.L.
Pub. info.: Microelectronic Device Technology : 1-2 October 1997, Austin, Texas.  pp.275-282,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3212
2.

Conference Proceedings
Conference Proceedings
2. Boron segregation in As-implanted Si due to electric field and transient enhanced diffusion
Chang,R.D. ; Choi,P.S. ; Wristers,D. ; Chu,P.K. ; Kwong,D.L.
Pub. info.: Microelectronic Device Technology : 1-2 October 1997, Austin, Texas.  pp.296-303,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3212
3.

Conference Proceedings
Conference Proceedings
3. Characteristics of BaXSr1-XTiO3 thin films by metallorganic chemical vapor deposition for ultrahigh-density DRAM application
Mim,B.W. ; Roh,J.S. ; Yan,J. ; Kwong,D.L.
Pub. info.: Microelectronic Device Technology : 1-2 October 1997, Austin, Texas.  pp.360-367,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3212
4.

Conference Proceedings
Conference Proceedings
4. Prospective technology for system-on-a-chip: N2 implant followed by VHP O2 reoxidation
Luo,T.Y. ; Al-Shareef,H.N. ; Brown,G.A. ; Watt,V.H.C. ; Karamcheti,A. ; Jackson,M.D. ; Huff,H.R. ; Evans,B. ; Lee,C.H. ; Luan,H.F. ; Kwong,D.L.
Pub. info.: Challenges in process integration and device technology : 18-19 September 2000, Santa Clara, USA.  pp.271-280,  2000.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4181
5.

Conference Proceedings
Conference Proceedings
5. Process optimization of dual-gate CMOS
Liu,I.M. ; Chen,Y.Y. ; Connor,C. ; Joshi,A.B. ; Kwong,D.L.
Pub. info.: Microelectronic Device Technology : 1-2 October 1997, Austin, Texas.  pp.72-79,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3212
6.

Conference Proceedings
Conference Proceedings
6. Hot-carrier degradation for deep-submicron N-MOSFETs introduced by back-end processing
Lie,D.Y.C. ; Xia,W. ; Yota,J. ; Joshi,A.B. ; Zwingman,R. ; Williams,R. ; Kerametlian,V. ; Cerney,D. ; Min,B.W. ; Kwong,D.L.
Pub. info.: Microelectronic Device Technology : 1-2 October 1997, Austin, Texas.  pp.258-267,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3212
7.

Conference Proceedings
Conference Proceedings
7. Quasi-breakdown in ultrathin dielectrics
Min,B.W. ; Kwong,D.L.
Pub. info.: Microelectronic Device Technology : 1-2 October 1997, Austin, Texas.  pp.80-86,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3212
8.

Conference Proceedings
Conference Proceedings
8. Materials and processing issues in the development of N2O/NO-based ultrathin oxynitride gate dielectrics for CMOS ULSI applications
Kim,B.Y. ; Wristers,D. ; Kwong,D.L.
Pub. info.: Microelectronic Device and Multilevel Interconnection Technology II.  pp.188-200,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2875