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13 results

Conference Proceedings

1. Evaluations of optical performance for micro-trench on quartz etch in ArF lithography [5853-67]

Ahn, W.-S. ; Kwon, H.-J. ; Moon, S.-Y. ; Choi, S.-W. ; Han, W.-S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XII. pp.818-826, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5853

Conference Proceedings

2. Modeling and correction of global CD uniformity caused by fogging and loading effects in 90-nm-node CAR process

Park, D.-I. ; Park, E.-S. ; Lee, J.-H. ; Jeong, W.-G. ; Seo, S.-K. ; Kwon, H.-J. ; Kim, J.-M. ; Jung, S.-M. ; Choi, S.-S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.78-85, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

3. Characteristics of selective MoSiON etching in a chlorine plasma

Chang, B.-S. ; Min, D.-S. ; Kwon, H.-J. ; Choi, B.-Y.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part One pp.702-712, 2002. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

Conference Proceedings

4. Higher anisotropy and improved surface conditions for 90-nm-node MoSiON ICP dry etch

Min, D.-S. ; Chang, B.-S. ; Kwon, H.-J. ; Choi, B.-Y.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part One pp.694-701, 2002. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

Conference Proceedings

5. Plasma etch of Cr masks utilizing TCP source for a next-generation plasma source

Kwon, H.-J. ; Min, D.-S. ; Jang, P.-J. ; Chang, B.-S. ; Choi, B.-Y. ; Jeong, S.-H.

Pub. info.:	18th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.60-65, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4764

Conference Proceedings

6. Application of multiple-wavelength absorption endpoint system in photomask dry etcher

Min, D.-S. ; Jang, P.-J. ; Kwon, H.-J. ; Choi, B.-Y. ; Jeong, S.H.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology IX. pp.341-349, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4754

Conference Proceedings

7. Highly anisotropic etching of phase-shift masks using ICP of CF4-SF6-CHF3 gas mixtures

Choi, S.-J. ; Cha, H.-S. ; Yoon, S.-Y. ; Kim, Y.-D. ; Lee, D.-H. ; Kim, J.-M. ; Kim, J.-S. ; Min, D.-S. ; Jang, P.-J. ; Chang, B.-S. ; Kwon, H.-J. ; Choi, B.-Y. ; Choi, S.-S. ; Jeong, S.H.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology IX. pp.303-311, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4754

Conference Proceedings

8. Dehydration bake effects with UV/O3 treatment for 130-nm node PSM processing

Kim, Y.-D. ; Lee, D.-S. ; Park, D.-I. ; Kwon, H.-J. ; Kim, J.-M. ; Jung, S.-M. ; Choi, S.-S.

Pub. info.:	23rd Annual BACUS Symposium on Photomask Technology. pp.392-399, 2003. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5256

Conference Proceedings

9. Comparative evaluation of mask cleaning performance

Jeong, W.-G. ; Park, D.- ; Park, E.-S. ; Cho, Y.-W. ; Choi, S.-J. ; Kwon, H.-J. ; Kim, J.-M. ; Choi, S.-S.

Pub. info.:	23rd Annual BACUS Symposium on Photomask Technology. pp.510-517, 2003. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5256

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Conference Proceedings

10. Decrease of chrome residue on MoSiON in embedded attenuated-PSM processing

Kim, Y.-D. ; Kim, D.-W. ; Lee, D.-S. ; Jang, P.-J. ; Kwon, H.-J. ; Cho, H.-J. ; Kim, J.-M. ; Choi, S.-S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XI. pp.193-199, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5446

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Author: Kwon, H.-J.