1.

Conference Proceedings
Conference Proceedings
1. Silsesquioxane-based 193 nm bilayer resists: characterization and lithographic evaluation
Bravo-Vasquez, J. P. ; Kwark, Y.-J. ; Ober, C. K. ; Cao, H. B. ; Deng, H.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.109-121,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
2.

Conference Proceedings
Conference Proceedings
2. Highly transparent resist platforms for 157-nm microlithography: an update
Vohra, V.R. ; Douki, K. ; Kwark, Y.-J. ; Liu, X.-Q. ; Ober, C.K. ; Bae, Y.C. ; Conley, W. ; Miller, D. ; Zimmerman, P.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.84-93,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
3.

Conference Proceedings
Conference Proceedings
3. Silicon backbone polymers as EUV resists
Bravo-Vasquez, J.P. ; Kwark, Y.-J. ; Ober, C.K. ; Cao, H.B. ; Deng, H. ; Meagley, R.P.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.739-745,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
4.

Conference Proceedings
Conference Proceedings
4. Novel silicon-containing polymers as photoresist materials for EUV lithography
Kwark, Y.-J. ; Bravo-Vasquez, J.-P. ; Ober, C.K. ; Cao, H.B. ; Deng, H. ; Meagley, R.P.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.1204-1211,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039