1.

Conference Proceedings
Conference Proceedings
1. Simulation of mask induced polarization effect on imaging in immersion lithography [6154-105]
Kwak, E. A. ; Jung, M. R. ; Kim, D.-G. ; Lee, J.-E. ; Oh, H.-K. ; Lee, S.
Pub. info.: Optical Microlithography XIX.  pp.61542T-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
2.

Conference Proceedings
Conference Proceedings
2. Evaluation of partial coherent imaging using the transfer function in immersion lithography [6154-103]
Jung, M. R. ; Kwak, E. A. ; Oh, H.-K. ; Shim, S.-B. ; Choi, N.-R. ; Kim, J.-S.
Pub. info.: Optical Microlithography XIX.  pp.61542R-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154