Muraoka, K. ; Kurihara, K. ; Yasuda, N. ; Satake, H.
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Silicon nitride and silicon dioxide thin insulating films VII : proceedings of the international symposium. pp.418-432, 2003. Pennington, N.J.. Electrochemical Society
Takahashi, Y. ; Ono, Y. ; Fujiwara, A. ; Yamazaki, K. ; Nagase, M. ; Namatsu, H. ; Kurihara, K. ; Murase, K.
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Advanced luminescent materials and quantum confinement : proceedings of the international symposium. pp.302-324, 1999. Pennington, NJ. Electrochemical Society
Saifullah, M. S. M. ; Namatsu, H. ; Yamaguchi, T. ; Yamazaki, K. ; Kurihara, K.
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Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California. pp.633-642, 1999. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Yamaguchi, T. ; Namatsu, H. ; Nagase, M. ; Kurihara, K. ; Kawai, Y.
Pub. info.:
Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California. pp.617-624, 1999. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Silicon Nitride and Silicon Dioxide Thin Insulating Films : proceedings of the sixth International Symposium. pp.264-273, 2001. Pennington, N.J.. Electrochemical Society
Nakamura, N. ; Itani, T. ; Chiba, H. ; Watanabe, K. ; Kurihara, K.
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Amorphous and nanostructured carbon : sympoisum held November 29-December 2, 1999, Boston, Massachusetts, U.S.A.. pp.415-, 2000. Warrendale, Pa.. MRS-Materials Research Society
Proceedings of the International Conference on Colloid and Surface Science, Tokyo, Japan, November 5-8, 2000 : 25th Anniversary of the Division of Colloid and Surface Chemistry, the Chemical Society of Japan. pp.869-872, 2001. Amsterdam. Elsevier
Proceedings of the International Conference on Colloid and Surface Science, Tokyo, Japan, November 5-8, 2000 : 25th Anniversary of the Division of Colloid and Surface Chemistry, the Chemical Society of Japan. pp.881-884, 2001. Amsterdam. Elsevier