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10 results

Conference Proceedings

1. Measurement of total integrated scatter of optical coatings for 157-nm lithography

Saito,T. ; Saito,J. ; Nakamura,E. ; Kudo,T. ; Kagaya,M. ; Takahashi,T.

Pub. info.:	Optical metrology roadmap for the semiconductor, optical, and data storage industries II : 2-3 August 2001 San Diego, USA. pp.22-29, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4449

Conference Proceedings

2. Thermochromic properties of double-doped V02 thin films fabricated from polyvanadate-based solutions

Takahashi,I. ; Hibino,M. ; Kudo,T.

Pub. info.:	Switchable materials and flat panel displays : 21-22 July 1999, Denver, Colorado. pp.26-33, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3788

Conference Proceedings

3. Material design and lithographic performance of novel hydroxystyrene-copolymer-based DUV negative resists

Kudo,T. ; Aramaki,K. ; Masuda,S. ; Pawlowski,G.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.644-654, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

4. Application of photodecomposable base concept to 193-nm resists

Padmanaban,M. ; Bae,J.-B. ; Cook,M.M. ; Kim,W.-K. ; Klauck-Jacobs,A. ; Kudo,T. ; Rahman,M.D. ; Dammel,R.R. ; Byers,J.D.

Pub. info.:	Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA. Part2 pp.1136-1146, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3999

Conference Proceedings

5. Cycloolefin-maleic anhydride copolymers for 193-nm resist compositions

Rahman,M.D. ; Bae,J.-B. ; Cook,M.M. ; Durham,D.L. ; Kudo,T. ; Kim,W.-K. ; Padmanaban,M. ; Dammel,R.R.

Pub. info.:	Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA. Part1 pp.220-227, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3999

Conference Proceedings

6. Irradiation Induced Lattice Defects in Si1-xGex Epitaxial Devices

Ohyama,H. ; Vanhellemont,J. ; Takami,Y. ; Hayama,K. ; Kudo,T. ; Hakata,T. ; Kobayashi,K. ; Sunaga,H. ; Poortmans,J. ; Caymax,M.

Pub. info.:	Proceedings of the 18th International Conference on Defects in Semiconductors : ICDS-18, Sendai, Japan, July 23-28, 1995. pp.371-376, 1995. Zurich, Switzerland. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	196-201

Technical Paper

7. The Effects of Pulsed Blowing on Jet Mixing and Noise Generation

Nedungadi,A. ; Barber,T.J. ; Nishimura,M. ; Kudo,T.

Pub. info.:	AIAA paper. pp.1-13, 2001. American Institute of Aeronautics and Astronautics
Title of ser.:	AIAA Paper : Aerospace Sciences Meeting and Exhibit
Ser. no.:	2001

Conference Proceedings

8. Lens aberration control for fine patterning with PSM

Kudo,T. ; Hirukawa,S. ; Nakashima,T. ; Matsumoto,K.

Pub. info.:	Optical Microlithography XIV. 4346 pp.713-722, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

Conference Proceedings

9. CD changes of 193-nm resists during SEM measurement

Kudo,T. ; Bae,J.-B. ; Dammel,R.R. ; Kim,W.-K. ; McKenzie,D.S. ; Rahman,M.D. ; Padmanaban,M. ; Ng,W.

Pub. info.:	Advances in Resist Technology and Processing XVIII. 4345 pp.179-189, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4345

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Conference Proceedings

10. Novel hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate for 193-nm resist compositions

Rahman,M.D. ; McKenzie,D.S. ; Bae,J.-B. ; Kudo,T. ; Kim,W.-K. ; Padmanaban,M. ; Dammel,R.R.

Pub. info.:	Advances in Resist Technology and Processing XVIII. 4345 pp.159-167, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4345

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Author: Kudo,T.