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35 results

Conference Proceedings

1. Negative photoresist for 157-nm microlithography: a progress report

Conley, W. ; Trinque, B.C. ; Miller, D.A. ; Zimmerman, P. ; Kudo, T. ; Dammel, R.R. ; Romano, A.R. ; Willson, C.G.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part One pp.94-100, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

Conference Proceedings

2. Cycloolefin/cyanoacrylate (COCA) copolymers for 193-nm and 157-nm lithography

Dammel, R.R. ; Sakamuri, R. ; Lee, S.-H. ; Rahman, M.D. ; Kudo, T. ; Romano, A.R. ; Rhodes, L.F. ; Lipian, J. ; Hacker, C. ; Barnes, D.A.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part One pp.101-109, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

Conference Proceedings

3. High-performance 193-nm resist composition using hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate

Rahman, M.D. ; Alemy, E. ; Conley, W. ; Miller, D. ; Dammel, R.R. ; Kim, W.-K. ; Kudo, T. ; Lee, S.-H. ; Masuda, S. ; McKenzie, D.S. ; Padmanaban, M.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part One pp.127-135, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

Conference Proceedings

4. Three-dimensional interactive processor which processes 64 directional images

Kudo, T. ; Takaki, Y.

Pub. info.:	Three-Dimensional TV, Video, and Display III. pp.16-23, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5599

Conference Proceedings

5. Direct Oxidation of Isobutane into Methacrylic Acid over Cs, Ni, and V-substituted H3PMo12O40 Heteropoly Compounds

Mizuno, N. ; Han, W. ; Kudo, T. ; Iwamoto, M.

Pub. info.:	11th International Congress on Catalysis, 40th anniversary : Proceedings of the 11th ICC, Baltimore, MD, USA, June 30-July 5, 1996. Part A pp.1001-, 1996. New York. Elsevier
Title of ser.:	Studies in surface science and catalysis
Ser. no.:	101

Conference Proceedings

6. Illumination, acid diffusion, and process optimization considerations for 193-nm contact hole resists

Kudo, T. ; Alemy, E.L. ; Dammel, R.R. ; Kim, W.-K. ; Lee, S.-H. ; Masuda, S. ; McKenzie, D.S. ; Rahman, M.D. ; Romano, A.R. ; Padmanaban, M. ; Chun, J.-S. ; Jung, J.-C. ; Lee, S.-K. ; Shin, K.-S. ; Kim, H.-S.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part One pp.150-159, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

Conference Proceedings

7. Proton conducting amorphous thin films fabricated from peroxo-polytungstates with acidic ligands: inorganic polymer electrolytes

Kudo, T. ; Hibino, M. ; Nakajima, H. ; Mizumo, N.

Pub. info.:	Proceedings of the Third International Symposium on Ionic and Mixed Conducting Ceramics. pp.8-16, 1997. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	97-24

Conference Proceedings

8. Recent Advances in Lithium-Based Complex Hydrides for Solid-State Hydrogen Storage

Nakamori, Y. ; Kitahara, G. ; Kudo, T. ; Yamagishi, T. ; Orimo, S.

Pub. info.:	PRICM 5 : the Fifth Pacific Rim International Conference on Advanced Materials and Processing, November 2-5, 2004, Beijing, China. pp.2431-2436, 2005. Uetikon-Zuerich. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	475-479(3)

Conference Proceedings

9. Lithium Intercalation into Coated Thin Films of a New 2-Dimensional Vanadium Oxide

Kudo, T. ; Hibino, M.

Pub. info.:	Proceedings of the Symposium on Thin Film Solid Ionic Devices and Materials. pp.31-45, 1995. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	95-22

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Conference Proceedings

10. Advanced RELACS (resolution enhancment of lithography by assist of chemical shrink) material for 193-nm lithography

Hong, S. ; Takano, Y. ; Kanda, T. ; Kudo, T. ; Padmanaban, M. ; Tanaka, H. ; Lee, S.-H. ; Lee, J.-H. ; Woo, S.-G.

Pub. info.:	Advances in resist technology and processing XX. 1 pp.195-206, 2003. Bellingham, CA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5039

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