PRODUCING AND CONTROLLING SUBSTRATE TEMPERATURE UNIFORMITY FROM 600｡？TO 1100｡？IN CVD ROTATING DISK REACTORS

PRODUCING AND CONTROLLING SUBSTRATE TEMPERATURE UNIFORMITY FROM 600｡？TO 1100｡？IN CVD ROTATING DISK REACTORS

Author(s):

Gurary, A. I.

Publication title:

Chemical vapor deposition of refractory metals and ceramics III : symposium held November 28-30, 1994, Boston, Massachusetts, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

363

Pub. Year:

1995

Page(from):

101

Pub. info.:

Pittsburgh, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558992641 [1558992642]

Language:

English

Call no.:

M23500/363

Type:

Conference Proceedings

Details

TDL ID:	ZA00019831
Series ID:	PA00000011
Conf. info. (Name):	Symposium on chemical vapor deposition of refractory metals and ceramics
Conf. info. (Number):	3rd
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	1994.11.28-1994.11.30

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