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Conference Proceedings
Conference Proceedings
1. INTERFACE AND GRAIN BOUNDARY STRUCTURES GRAIN BOUNDARY The Precipitate-Nucleation in the Vicinity of Solubility Limit
Miyazaki, T. ; Kozakai, T. ; Schoen, C.G.
Pub. info.: New frontiers of processing and engineering in advanced materials : proceedings of the International Conference on New Frontiers of Process Scinence and Engineering in Advanced Materials : The 14th Iketani Conference, November, 24-26, 2004, held in Kyoto, Japan.  pp.139-144,  2005.  Zuerich, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 502
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Conference Proceedings
Conference Proceedings
2. TEM Observations of the Precipitation of A2 Particles in D03 Precipitates in Fe-Si-V Alloy System
Doi, M. ; Sakai, D. ; Koyama, T. ; Kozakai, T. ; Moritani, T.
Pub. info.: Designing, processing and properties of advanced engineering materials : proceedings of the 3rd International Symposium on Designing, Processing and Properties of Advanced Engineering Materials, held in Jeju, Korea, November 5-8, 2003.  pp.529-532,  2004.  Zuerich.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 449-452
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Conference Proceedings
Conference Proceedings
3. Coarsening Kinetics of B2 Precipitate Particles in an Elastically Constrained Fe-Al-Co Alloy
Maebashi, T. ; Doi, M. ; Kozakai, T.
Pub. info.: Designing, processing and properties of advanced engineering materials : proceedings of the 3rd International Symposium on Designing, Processing and Properties of Advanced Engineering Materials, held in Jeju, Korea, November 5-8, 2003.  pp.521-524,  2004.  Zuerich.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 449-452
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Conference Proceedings
Conference Proceedings
4. Metastable Two-Phase Field(A2+B2) in Co-Al-Fe and Co-Al Alloy Systems
Kozakai, T. ; Shikama, T. ; Koyama, T. ; Doi, M.
Pub. info.: Designing, processing and properties of advanced engineering materials : proceedings of the 3rd International Symposium on Designing, Processing and Properties of Advanced Engineering Materials, held in Jeju, Korea, November 5-8, 2003.  pp.61-64,  2004.  Zuerich.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 449-452
5.

Conference Proceedings
Conference Proceedings
5. Development of focused ion-beam repair for opaque defects on MoSi-based attenuated phase-shift mask
Nishida, N. ; Nishio, Y. ; Kinoshita, H. ; Takaoka, O. ; Kozakai, T. ; Aita, K.
Pub. info.: Photomask and X-Ray Mask Technology VI.  pp.599-608,  1999.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3748
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Conference Proceedings
Conference Proceedings
6. Advanced FIB mask repair technology for 100-nm/ArF lithography: II
Hagiwara, R. ; Yasaka, A. ; Aita, K. ; Takaoka, O. ; Koyama, Y. ; Kozakai, T. ; Doi, T. ; Muramatsu, M. ; Suzuki, K. ; Sugiyama, Y. ; Matsuda, O. ; Okabe, M. ; Shinohara, S. ; Hasuda, M. ; Adachi, T. ; Morikawa, Y. ; Nishiguchi, M. ; Sato, Y. ; Hayashi, N. ; Ozawa, T. ; Tanaka, Y. ; Yoshioka, N.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.510-519,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
7.

Conference Proceedings
Conference Proceedings
7. Advanced photomask repair technology for 65-nm lithography: II
Itou, Y. ; Tanaka, Y. ; Yoshioka, N. ; Sugiyama, Y. ; Hagiwara, R. ; Takahashi, H. ; Takaoka, O. ; Kozakai, T. ; Matsuda, O. ; Suzuki, K. ; Okabe, M. ; Kikuchi, S. ; Uemoto, A. ; Yasaka, A. ; Adachi, T. ; Nishida, N. ; Ozawa, T.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.1132-1143,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
8.

Conference Proceedings
Conference Proceedings
8. Advanced photomask repair technology for 65 nm lithography (4) [5992-170]
Itou, Y. ; Tanaka, Y. ; Suga, O. ; Sugiyama, Y. ; Hagiwara, R. ; Takahashi, H. ; Takaoka, O. ; Kozakai, T. ; Matsuda, O. ; Suzuki, K. ; Okabe, M. ; Kikuchi, S. ; Uemoto, A. ; Yasaka, A. ; Adachi, T.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59924Y-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
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Conference Proceedings
Conference Proceedings
9. Advanced photomask repair technology for 65-nm lithography [6349-50]
Aramaki, F. ; Kozakai, T. ; Muramatsu, M. ; Sugiyama, Y. ; Koyama, Y. ; Matsuda, O. ; Suzuki, K. ; Okabe, M. ; Doi, T. ; Hagiwara, R. ; Adachi, T. ; Yasaka, A. ; Tanaka, Y. ; Suga, O ; Nishida, N.
Pub. info.: Photomask Technology 2006.  pp.63491E-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
10.

Conference Proceedings
Conference Proceedings
10. Advanced FIB mask repair technology for 100-nm/ArF lithography
Hagiwara, R. ; Yasaka, A. ; Aita, K. ; Takaoka, O. ; Koyama, Y. ; Kozakai, T. ; Doi, T. ; Muramatsu, M. ; Suzuki, K. ; Sugiyama, Y. ; Sawaragi, H. ; Okabe, M. ; Shinohara, S. ; Hasuda, M. ; Adachi, T. ; Morikawa, Y. ; Nishiguchi, M. ; Sato, Y. ; Hayashi, N. ; Ozawa, T. ; Tanaka, Y. ; Yoshioka, N.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1056-1064,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889