1.

Conference Proceedings
Conference Proceedings
1. TiSi-nitride-based attenuated phase-shift mask for ArF Lithography
Koo,S.-S. ; Hur,I.-B. ; Koo,Y.-M. ; Baik,K.-H. ; Choi,I.-H. ; Kim,L.-J. ; Park,K.-T. ; Shin,C.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.969-978,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
2.

Conference Proceedings
Conference Proceedings
2. Comparison study of mask error effects for various mask-making processes
Eom,T.-S. ; Hur,I.-B. ; Koo,Y.-M. ; Baik,K.-H. ; Choi,I.-H. ; Kim,D.Y. ; Shin,C.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.734-745,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
3.

Conference Proceedings
Conference Proceedings
3. Accuracy of diffused aerial image model for full-chip-level optical proximity correction
Hong,J.-S. ; Kim,H.-B. ; Yune,H.-S. ; Ahn,C.-N. ; Koo,Y.-M. ; Baik,K.-H.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1024-1032,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
4.

Conference Proceedings
Conference Proceedings
4. Validation of repair process for DUV attenuated phase-shift mask
Paek,S.W. ; Kim,H.-B. ; Ahn,C.-N. ; Koo,Y.-M. ; Baik,K.-H.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.612-620,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000